A Study on the Cl2/C2H4/Ar Plasma Etching of ITO Using Inductively Coupled Plasma

Author(s):  
Rong Fang ◽  
Xia Guo ◽  
Wen Jing Jiang ◽  
Yu Han Guo ◽  
Yuan Qin ◽  
...  
2009 ◽  
Author(s):  
Rong Fang ◽  
Wen Jing Jiang ◽  
Xia Guo ◽  
Jin Ru Han ◽  
Guang Di Shen

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  

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