A Study on the Cl2/C2H4/Ar Plasma Etching of ITO Using Inductively Coupled Plasma
2004 ◽
Vol 22
(6)
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pp. 2336-2341
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2002 ◽
Vol 63
(4)
◽
pp. 353-361
◽
2005 ◽
Vol 34
(6)
◽
pp. 740-745
◽