Inductively Coupled Plasma (ICP) discharges are part of intense research. Predicting different plasma parameters, like the distribution and temperature of the present species, is of great interest for many applications. Iodine- or halide-containing plasmas in particular have an important function, for example, in the development of mercury-free UV radiation sources. Therefore, a 2D simulation model of a xenon- and iodine-containing ICP was created by using the Finite Element Method (FEM) software COMSOL Multiphysics®. The included species and the used reactions are presented in this paper. To verify the simulation in relation to the plasma distribution, the results were compared with measurements from literature. The temperature of the lamp vessel was measured in relation to the temperature distribution and also compared with the results of the simulation. It could be shown that the simulation reproduces the plasma distribution with a maximal deviation of ≈6.5% to the measured values and that the temperature distribution in the examined area can be predicted with deviations of up to ≈24% for long vessel dimensions and ≈3% for shorter dimensions. However, despite the deviating absolute values, the general plasma behaviour is reproduced by the simulation. The simulation thus offers a fast and cost-effective method to estimate an effective geometrical range of iodine-containing ICPs.
Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasma
