Design of highly sensitive refractive index sensors in the visible region utilizing metal layer assisted guided modes

2021 ◽  
Author(s):  
Vipul Pandey ◽  
Suchandan Pal
Keyword(s):  
Refractive Index ◽  
Metal Layer ◽  
Visible Region ◽  
Guided Modes ◽  
Highly Sensitive ◽  
Refractive Index Sensors

scholarly journals Fiber Optic Refractive Index Sensors Based on a Ball Resonator and Optical Backscatter Interrogation

Sensors ◽  
2020 ◽  
Vol 20 (21) ◽  
pp. 6199
Author(s):  
Madina Shaimerdenova ◽  
Takhmina Ayupova ◽  
Marzhan Sypabekova ◽  
Daniele Tosi
Keyword(s):  
Refractive Index ◽  
Reflection Spectrum ◽  
Return Loss ◽  
Fiber Optic ◽  
Single Mode ◽  
Wavelength Shift ◽  
Amplitude Change ◽  
Highly Sensitive ◽  
Refractive Index Sensors ◽  
Index Unit

In this work, we introduced fabrication and interrogation of simple and highly sensitive fiber-optic refractive index (RI) sensors based on ball resonators built on the tip of single-mode fibers. The probes have been fabricated through a CO2 fiber splicer, with a fast (~600 s) and repeatable method. The ball resonator acted as a weak interferometer with a return loss below −50 dB and was interrogated with an optical backscatter reflectometer measuring the reflection spectrum. The ball resonators behaved as weak interferometers with a shallow fringe and a spectrum that appeared close to a random signal, and RI sensitivity could be measured either through wavelength shift or amplitude change. In this work, we reported four samples having sensitivity ranges 48.9–403.3 nm/RIU and 256.0–566.2 dB/RIU (RIU = refractive index unit). Ball resonators appeared as a sensitive and robust platform for RI sensing in liquid and can be further functionalized for biosensing.

Highly Sensitive Refractive Index Sensors with Plasmonic Nanoantennas−Utilization of Optimal Spectral Detuning of Fano Resonances

ACS Sensors ◽  
2018 ◽  
Vol 3 (5) ◽  
pp. 960-966 ◽  
Author(s):  
Martin Mesch ◽  
Thomas Weiss ◽  
Martin Schäferling ◽  
Mario Hentschel ◽  
Ravi S. Hegde ◽  
...  
Keyword(s):  
Refractive Index ◽  
Fano Resonances ◽  
Highly Sensitive ◽  
Plasmonic Nanoantennas ◽  
Refractive Index Sensors

scholarly journals Coreless side-polished fiber: a novel fiber structure for multimode interference and highly sensitive refractive index sensors

2017 ◽  
Vol 25 (5) ◽  
pp. 5352 ◽  
Author(s):  
Huazhuo Dong ◽  
Liheng Chen ◽  
Junjie Zhou ◽  
Jianhui Yu ◽  
Heyuan Guan ◽  
...  
Keyword(s):  
Refractive Index ◽  
Multimode Interference ◽  
Fiber Structure ◽  
Highly Sensitive ◽  
Refractive Index Sensors ◽  
Side Polished Fiber

scholarly journals Highly sensitive fiber Bragg grating refractive index sensors

2005 ◽  
Vol 86 (15) ◽  
pp. 151122 ◽  
Author(s):  
Wei Liang ◽  
Yanyi Huang ◽  
Yong Xu ◽  
Reginald K. Lee ◽  
Amnon Yariv
Keyword(s):  
Refractive Index ◽  
Fiber Bragg Grating ◽  
Bragg Grating ◽  
Highly Sensitive ◽  
Refractive Index Sensors

Plasmonic Core–Satellite Assemblies as Highly Sensitive Refractive Index Sensors

2015 ◽  
Vol 119 (10) ◽  
pp. 5577-5582 ◽  
Author(s):  
Janak Prasad ◽  
Inga Zins ◽  
Robert Branscheid ◽  
Jan Becker ◽  
Amelie H. R. Koch ◽  
...  
Keyword(s):  
Refractive Index ◽  
Highly Sensitive ◽  
Refractive Index Sensors

Refractive Index Sensors using Polarization-independent Metamaterial

2017 ◽  
Vol 137 (11) ◽  
pp. 415-416 ◽  
Author(s):  
Tomoki Shimizu ◽  
Yoshiaki Kanamori ◽  
Kazuhiro Hane
Keyword(s):  
Refractive Index ◽  
Refractive Index Sensors ◽  
Polarization Independent

Influence of Etching Regimes on the Reflectance of Black Silicon Films Formed by Ni-Assisted Chemical Etching

2019 ◽  
Vol 806 ◽  
pp. 24-29 ◽  
Author(s):  
Olga V. Volovlikova ◽  
S.A. Gavrilov ◽  
P.I. Lazarenko ◽  
A.V. Kukin ◽  
A.A. Dudin ◽  
...  
Keyword(s):  
Refractive Index ◽  
Treatment Duration ◽  
Chemical Etching ◽  
Visible Region ◽  
High Light ◽  
Silicon Films ◽  
Black Silicon ◽  
Metal Assisted Chemical Etching ◽  
Light Absorptance

This paper examines the influence of etching regimes on the reflectance of black silicon formed by Ni-assisted chemical etching. Black silicon exhibits properties of high light absorptance. The measured minimum values of the reflectance (R-min) of black silicon with thickness of 580 nm formed by metal-assisted chemical etching (MACE) for 60 minutes at 460 lx illumination were 2,3% in the UV region (200–400 nm), 0,5% in the visible region (400–750 nm) and 0,3% in the IR region (750–1300 nm). The findings showed that the reflectance of black silicon depends on its thickness, illumination and treatment duration. In addition, the porosity and refractive index were calculated.

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