Photonic Band Structure of Circular Photonic Crystals in Silicon-on-Insulator Slab by Surface Coupling Reflectivity Technique

2011 ◽  
Author(s):  
Jian Hung Lin ◽  
Danh Bich Do ◽  
Georg W. Rieger ◽  
Jeff F. Young ◽  
Hung-Chih Kan ◽  
...  
2006 ◽  
Vol 988 ◽  
Author(s):  
Michael H. Bartl ◽  
Kaycee Carter ◽  
Michael H. Bartl

AbstractBy applying directional pressure along the (111) crystal axis of opaline photonic crystals under controlled temperatures, inverse opals with symmetry broken structures are fabricated. This selective deformation results in strongly modified photonic band structures and hence optical properties of the photonic crystals. Experimental data are accompanied by theoretical band structure calculations that confirm the experimental results and are used to predict new structures with optimized band gap properties.


2008 ◽  
Vol 8 (12) ◽  
pp. 6584-6588 ◽  
Author(s):  
R. Márquez-Islas ◽  
B. Flores-Desirena ◽  
F. Pérez-Rodríguez

We investigate theoretically the coupling of exciton with light in a one-dimensional photonic crystal. The unit cell of the crystal consists of two alternating layers, namely a metallic layer and a semiconductor one. The frequency-dependent dielectric function of the metal is described by the Drude model, whereas for the semiconductor we use a nonlocal excitonic dielectric function. The polariton dispersion for s-polarized modes in the metal-semiconductor photonic crystal is compared with that for a dielectric-semiconductor photonic crystal. Because of the metal layers, a low-frequency gap appears in the photonic band structure. The presence of the semiconductor gives rise to photonic bands associated with the coupling of light with size-quantized excitón states. At frequencies above the longitudinal exciton frequency, the photonic band structure exhibits anticrossing phenomena produced by the upper exciton–polariton mode and size-quantized excitons. It is found that the anticrossing phenomena in the metal-semiconductor photonic crystal occur at higher frequencies in comparison with the dielectric-semiconductor case.


2000 ◽  
Vol 61 (11) ◽  
pp. 7165-7168 ◽  
Author(s):  
M. Notomi ◽  
T. Tamamura ◽  
Y. Ohtera ◽  
O. Hanaizumi ◽  
S. Kawakami

1998 ◽  
Vol 533 ◽  
Author(s):  
V. Lehmann ◽  
U. Grüning ◽  
A. Birner

AbstractThe formation of macropore arrays with high aspect ratios by electrochemical etching of n-type silicon in hydrofluoric acid is a well established technique. By using standard photolithograpy the geometry of the array can be controlled with high precision. This enables us to fabricate twodimensional photonic crystals for the infrared regime. The calculated photonic band structure of the crystal corresponds well with the transmission observed experimentally. Furthermore first defect structures like waveguides and cavities have been realized.


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