scholarly journals Effect on the longitudinal coherence properties of a pseudothermal light source as a function of source size and temporal coherence

2019 ◽  
Vol 44 (7) ◽  
pp. 1817 ◽  
Author(s):  
Azeem Ahmad ◽  
Tanmoy Mahanty ◽  
Vishesh Dubey ◽  
Ankit Butola ◽  
Balpreet Singh Ahluwalia ◽  
...  
2010 ◽  
Vol 18 (19) ◽  
pp. 19681 ◽  
Author(s):  
Peter R. T. Munro ◽  
Konstantin Ignatyev ◽  
Robert D. Speller ◽  
Alessandro Olivo

2016 ◽  
Vol 23 (5) ◽  
pp. 1137-1142 ◽  
Author(s):  
Elena Eggl ◽  
Martin Dierolf ◽  
Klaus Achterhold ◽  
Christoph Jud ◽  
Benedikt Günther ◽  
...  

While large-scale synchrotron sources provide a highly brilliant monochromatic X-ray beam, these X-ray sources are expensive in terms of installation and maintenance, and require large amounts of space due to the size of storage rings for GeV electrons. On the other hand, laboratory X-ray tube sources can easily be implemented in laboratories or hospitals with comparatively little cost, but their performance features a lower brilliance and a polychromatic spectrum creates problems with beam hardening artifacts for imaging experiments. Over the last decade, compact synchrotron sources based on inverse Compton scattering have evolved as one of the most promising types of laboratory-scale X-ray sources: they provide a performance and brilliance that lie in between those of large-scale synchrotron sources and X-ray tube sources, with significantly reduced financial and spatial requirements. These sources produce X-rays through the collision of relativistic electrons with infrared laser photons. In this study, an analysis of the performance, such as X-ray flux, source size and spectra, of the first commercially sold compact light source, the Munich Compact Light Source, is presented.


2012 ◽  
Vol 90 ◽  
pp. 0-0
Author(s):  
Y JIA ◽  
G BARGARY ◽  
JL BARBUR

2015 ◽  
Vol 4 (4) ◽  
Author(s):  
Takashi Sato ◽  
Akiko Yamada ◽  
Takeshi Suto

AbstractUsing a simulation, we investigate the effects of the light source size and derive an effective method for suppression of the subfringes that appear in ArF Talbot lithography, which has been proposed for submicron pattern transfer applications. The appearance of the subfringes, which were caused by interference, was related to the size of the light source. If an appropriate light source size is chosen, then, a large process window can be obtained. Guidelines for source size selection are given.


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