International Activity of IEEJ Industry Applications Society : Overview

2016 ◽  
Vol 136 (4) ◽  
pp. 202-204 ◽  
Author(s):  
Shinzo TAMAI
Keyword(s):  
International Activity ◽  
Industry Applications

Ti-0.20Pd

Alloy Digest ◽  
1968 ◽  
Vol 17 (3) ◽  
Keyword(s):  
Corrosion Resistance ◽  
Titanium Alloy ◽  
High Temperature ◽  
Physical Properties ◽  
Chemical Industry ◽  
Heat Treating ◽  
Temperature Performance ◽  
Industry Applications ◽  
Reactive Metals ◽  
Alpha Type

Abstract Ti-0.20Pd is an alpha-type titanium alloy recommended for the chemical industry applications where environments are moderately reducing, or fluctuate between oxidizing and reducing. This datasheet provides information on composition, physical properties, hardness, elasticity, and tensile properties. It also includes information on high temperature performance and corrosion resistance as well as forming, heat treating, machining, and joining. Filing Code: Ti-56. Producer or source: Reactive Metals Corporation.

Management of intercultural communications for an organization leading an international activity

2019 ◽  
pp. 151-159
Author(s):  
S.G. Malikova ◽  
N.Yu. Ivanova
Keyword(s):  
Business Environment ◽  
Cross Cultural ◽  
International Activity ◽  
Intercultural Communications

The necessity to establish intercultural communications for organizations is an aspect of globalization. It is important for an organization with international contacts to manage cross-cultural communications for control of the situation. The authors suggest an approach to study particularities of a country business environment and demonstrate examples of implementing it into practice.

scholarly journals Remarkable plasma-resistance performance by nanocrystalline Y2O3·MgO composite ceramics for semiconductor industry applications

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Hyeon-Myeong Oh ◽  
Young-Jo Park ◽  
Ha-Neul Kim ◽  
Kundan Kumar ◽  
Jae-Woong Ko ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Semiconductor Industry ◽  
High Plasma ◽  
Hot Press ◽  
Composite Ceramics ◽  
Plasma Resistance ◽  
Industry Applications ◽  
Hot Press Sintering ◽  
Resistance Performance ◽  
First Time

AbstractMotivated by recent finding of crystallographic-orientation-dependent etching behavior of sintered ceramics, the plasma resistance of nanocrystalline Y2O3-MgO composite ceramics (YM) was evaluated for the first time. We report a remarkably high plasma etching resistance of nanostructure YM surpassing the plasma resistance of commercially used transparent Y2O3 and MgAl2O4 ceramics. The pore-free YM ceramic with grain sizes of several hundred nm was fabricated by hot press sintering, enabling theoretical maximum densification at low temperature. The insoluble two components effectively suppressed the grain growth by mutual pinning. The engineering implication of the developed YM nanocomposite imparts enhanced mechanical reliability, better cost effectiveness with excellent plasma resistance property over their counterparts in plasma using semiconductor applications.

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