The study on charge-density distribution in TiAl by quantitative electron crystallography method
1995 ◽
Vol 10
(8)
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pp. 1913-1916
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Keyword(s):
Structure factors of μ-TiAl equiaxed grain in TiAl duplex intermetallic compound before and after V-alloying were measured by the quantitative electron crystallography method. Then the structure factors were transferred into charge-density distributions of real space. Comparing the charge-density distributions in γ-TiAl with those in V-alloyed γ-TiAl, it was found that V-alloying with the optimum amount decreases the electronic charge density in the Ti-Ti interatomic bond, and increases the electronic charge density in the Al-Al interatomic bond and Ti-Al interatomic bond. Thus, the anisotropy of charge-density distribution in γ-TiAl equiaxed grain is reduced.
1997 ◽
Vol 51
(2)
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pp. 135-141
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1974 ◽
Vol 62
(1)
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pp. 235-248
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2007 ◽
Vol 822
(1-3)
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pp. 116-121
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1998 ◽
Vol 58
(4)
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pp. 361-372
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Keyword(s):
1998 ◽
Vol 34
(3-4)
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pp. 455-462
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1998 ◽
Vol 54
(6)
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pp. 912-920
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2004 ◽
Vol 384
(1-3)
◽
pp. 40-44
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2007 ◽
Vol 8
(2)
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pp. 103-115
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