Low Energy Ne Scattering Spectroscopy for Insulators, and Materials in the Electric/Magnetic Fields

2011 ◽  
Vol 1318 ◽  
Author(s):  
Kenji Umezawa ◽  
Shigemitsu Nakanishi ◽  
Hideki Hayashi ◽  
Hideaki Higashitsutsumi ◽  
Hiroki Nagasawa ◽  
...  
Keyword(s):  
Structural Analysis ◽  
Magnetic Fields ◽  
Surface Structure ◽  
Surface Analysis ◽  
Ion Beam ◽  
Low Energy ◽  
Insulator Surface ◽  
Atom Scattering ◽  
Analysis Technique ◽  
Fundamental Research

ABSTRACTThis study describes a low-energy atom scattering system that was combined with a time-of-flight spectrometer for insulator surface structural analysis. We show one example. MgO(001) crystal was used to study the surface analysis technique and is illustrated here. Insulator surface structure is difficult to study because of the charging effects during electron or ion-beam bombardment. Nevertheless, structural analysis of insulator surfaces is very important in fundamental research as well as in technology fields.

Low Energy Atom Scattering Spectroscopy for Insulator Surface Analysis: MgO(111) Surfaces

2013 ◽  
Vol 1531 ◽  
Author(s):  
K. Umezawa
Keyword(s):  
Structural Analysis ◽  
Surface Analysis ◽  
Vacuum Chamber ◽  
High Vacuum ◽  
Visual Image ◽  
Low Energy ◽  
Ultra High Vacuum ◽  
Insulator Surface ◽  
Atom Scattering ◽  
Lattice Planes

ABSTRACTThis study described a low-energy atom scattering system combined with a time-of-flight spectrometer and an ultra high vacuum chamber for insulator surface structural analysis. We show one of examples to study of MgO(111) surface analysis. A visual image of Mg atoms due to the projected blocking pattern represents the crystalline structure of the MgO(111) surfaces. This figure shows the trajectory of scattered 4He0 particles due to Mg atoms along low-index lattice planes and crystallographic directions. Insulator surface structural analysis becomes more important in materials sciences.

Development of a low energy Ne atom scattering system for insulator surface strctural analysis

2005 ◽  
Vol 908 ◽  
Author(s):  
Kenji Umezawa ◽  
E Narihiro ◽  
K Oda ◽  
Shigemitsu Nakanishi ◽  
Walter M Gibson
Keyword(s):  
Ion Beam ◽  
Time Of Flight ◽  
Low Energy ◽  
Primary Beam ◽  
Scattering System ◽  
Insulator Surface ◽  
Detection Systems ◽  
Neutral Beams ◽  
Atom Scattering ◽  
Fundamental Research

AbstractWe have been developing a low energy Ne atom scattering system combined with a time-of-flight spectrometer for insulator surface structural analysis. Insulator surface structure is difficult to study because of charging effects during electron or ion beam bombardment. Structural analyses of insulator surfaces are very important in fundamental research as well as technology fields. In our system, charged ion beams of 2 keV-Ne+ are converted into neutral beams by charge exchange with the same element gas after the primary beam passes through a chopper. Other features of this system are pulsed beams, time-of-flight measurements, and a micochannel plate (MCP) detector is coaxially mounted along the primary beam. This is a home made equipment. We will show the detection systems, as well.

Low energy ion beam scattering for surface analysis

Vacuum ◽  
1989 ◽  
Vol 39 (2-4) ◽  
pp. 367-371 ◽  
Author(s):  
W Heiland
Keyword(s):  
Surface Analysis ◽  
Ion Beam ◽  
Low Energy ◽  
Beam Scattering

Scattering of Low Energy Ions (He+ and Ar+) as a Surface Analysis Technique

1972 ◽  
Vol 9 (2) ◽  
pp. 611-611 ◽  
Author(s):  
D. J. Ball ◽  
T. M. Buck ◽  
C. G. Caldwell ◽  
D. MacNair ◽  
G. H. Wheatley
Keyword(s):  
Surface Analysis ◽  
Low Energy ◽  
Analysis Technique ◽  
Low Energy Ions

A telescope counter detection system applied to low-energy ion-beam surface analysis

1974 ◽  
Vol 119 ◽  
pp. 373-380 ◽  
Author(s):  
Jean-Paul Thomas ◽  
Jean Engerran ◽  
Alain Cachard ◽  
Jacques Tardy
Keyword(s):  
Surface Analysis ◽  
Detection System ◽  
Ion Beam ◽  
Low Energy ◽  
Beam Surface

Cluster Ion Beam Processing: Review of Current and Prospective Applications

2011 ◽  
Vol 1354 ◽  
Author(s):  
Isao Yamada ◽  
Joseph Khoury
Keyword(s):  
Surface Analysis ◽  
Energy Surface ◽  
Ion Beam ◽  
Industrial Applications ◽  
Low Energy ◽  
High Rate ◽  
Cluster Ions ◽  
Current Status ◽  
Cluster Ion ◽  
Beam Characteristics

ABSTRACTCluster ion beam processes which employ ions comprised of a few hundred to several thousand atoms are being developed into a new field of ion beam technology. The processes are characterized by low energy surface interaction effects, lateral sputtering phenomena and high-rate chemical reaction effects. This paper reviews the current status of studies of the fundamental cluster ion beam characteristics as they apply to nanoscale processing and present industrial applications. As new prospective applications, techniques are now being developed to employ cluster ions in surface analysis tools such as XPS and SIMS and to modify surfaces of bio-materials. Results related to these new projects will also be reviewed.

Chemical Precursors for GaAs Etching with low Energy ion Beams: Chlorine adsorption on GaAs(100)

1991 ◽  
Vol 223 ◽  
Author(s):  
Richard B. Jackman ◽  
Glenn C. Tyrrell ◽  
Duncan Marshall ◽  
Catherine L. French ◽  
John S. Foord
Keyword(s):  
Ion Beam ◽  
Ion Beams ◽  
Low Energy ◽  
Ion Beam Etching ◽  
Chlorine Adsorption

ABSTRACTThis paper addresses the issue of chlorine adsorption on GaAs(100) with respect to the mechanisms of thermal and ion-enhanced etching. The use of halogenated precursors eg. dichloroethane is also discussed in regard to chemically assisted ion beam etching (CAIBE).

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