Tunneling Contributions to NiP and Pin Hydrogenated Amorphous Silicon Devices
Keyword(s):
It is well known that the performance of hydrogenated amorphous silicon (a-Si) p-i-n type devices is determined by the sequence of deposition. For instance, the stainless steel/p-i-n configuration generally shows a larger value of the open circuit voltage (up to 200mV) compared to the n-i-p sequence of deposition \1,2]. Explanations of this phenomena such as the Dember potential \1], self field effect \2], residual doping \3], hydrogen effusion effects associated with the p+ layer deposition process \4, 5] are unable to satisfactorily explain the difference in performance.
1990 ◽
Vol 29
(Part 2, No. 1)
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pp. L27-L29
1986 ◽
Vol 39
(4)
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pp. 277-286
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2011 ◽
Vol 50
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pp. 120204
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2011 ◽
Vol 50
(12R)
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pp. 120204
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