Deposition and Etching of Amorphous Carbon Films Prepared by ECR-Plasma-Enhanced Benzene Chemical Vapor Deposition

1998 ◽  
Vol 555 ◽  
Author(s):  
Xiao-Hua Chen ◽  
Laren M. Tolbert ◽  
Z. Y. Ning ◽  
Dennis W. Hess
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Electron Cyclotron Resonance ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Benzene Vapor ◽  
Plasma Etch ◽  
Ecr Plasma ◽  
Amorphous Hydrogenated Carbon

AbstractAmorphous hydrogenated carbon thin films have been deposited from benzene vapor in a microwave electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (CVD) system. Plasma enhanced dissociation and reaction of benzene were monitored by mass spectrometry. Deposited films were characterized by Fourier transform infrared spectroscopy and fluorescence spectroscopy. The effect of the deposition rate on the film density and plasma etch resistance was also studied. The etch resistance of deposited carbon film is higher than the conventional resist Novolac.

A Comparison of Diamond-Like Carbon Films Properties Obtained by Plasma Enhanced Chemical Vapor Deposition and Electro-Deposition

2016 ◽  
Vol 852 ◽  
pp. 1029-1033 ◽  
Author(s):  
Ning Wang ◽  
Jing Wang ◽  
Fu Wei Zheng ◽  
Yu Min Wu ◽  
Bao Rong Hou
Keyword(s):  
Raman Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Electron Cyclotron Resonance ◽  
Electrochemical Impedance ◽  
Low Cost ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Electro Deposition

This paper compares the microstructure and electrochemical properties of the diamond-like carbon films obtained by two different deposition methods - microwave electron cyclotron resonance plasma enhanced chemical vapor deposition (MWECR-PECVD) techniques and electro-deposition – chosen for their low cost and capacity to produce films. The microstructure of the DLC films are investigated by Raman spectroscopy, FTIR spectroscopy, and electrochemical behavior is investigated by potentiodynamic and electrochemical impedance spectroscopy (EIS). Raman spectroscopy indicates that all the films deposited by different techniques show amorphous structure and typical characteristic of DLC film. FTIR spectrum results indicate that these DLC films are a-C:H films. As a result of EIS, the DLC films made by different methods showed obviously different electrochemical characters. The obtained results show that the DLC films deposited using the PECVD methods provided the better results, presenting a high corrosion resistance , high adherence to substrate, and a denser and more uniform surface.

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