Chemical Wear of Cu CMP

2000 ◽  
Vol 613 ◽  
Author(s):  
Hong Liang

In this work, we used surface analysis techniques, such as a field-emission highresolution analytical TEM, X-ray spectroscopy, and XPS to analyze abrasive particles after polishing. Results showed evidence of copper oxide (Cu2O) in the polished slurry. However, there was no metallic crystalline copper detected. After comparing these data with the results obtained from our electro-chemical experiments, we propose two possible chemical wear mechanisms in Cu CMP.

2003 ◽  
Vol 767 ◽  
Author(s):  
H. Liang ◽  
G. Helen Xu ◽  
J.M. Martin ◽  
Th. Le Mongne

We conducted fundamental investigation of interfacial interactions between copper and polyurethane surfaces. Using in situ surface analysis techniques we were able to evaluate effects of water molecules on both materials surfaces during rubbing. Evidence of transferring elements between copper and urethane surfaces due to friction was found. Further investigation on pad wear indicated that transfer wear was taking a major role during copper CMP and mixed wear modes dominated pad wear.


2021 ◽  
Vol 8 ◽  
Author(s):  
Alexandra Waskow ◽  
Alan Howling ◽  
Ivo Furno

Surface characterization of plasma-treated seeds has made significant progress over the last decade. Most papers in the literature use scanning electron microscopy (SEM) and contact angle goniometry to investigate surface modifications. However, very few papers address the chemical modifications to the seed coat after plasma treatment. Here, a summary of the methods used to analyze plasma-treated seeds is presented, such as SEM, contact angle goniometry, energy-dispersive X-ray spectroscopy (EDX), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR). The results obtained on Arabidopsis thaliana Col-0 seeds and the limitations of these techniques are discussed. An experiment was designed in order to compare the relative advantages and limitations of these surface analysis techniques by investigating the separate effects of plasma, heat, and ozone on A. thaliana seeds.


Author(s):  
J. F. Moulder ◽  
J. M. Burkstrand ◽  
C. D. Wagner

As the dimensions of microelectronic devices continue to shrink, the use of surface sensitive analysis techniques to characterize thin film structures continues to grow. These techniques including: ESCA or XPS (X-ray photoelectron spectroscopy), AES (Auger electron spectroscopy), SIMS (secondary ion mass spectroscopy) and ISS (ion scattering spectroscopy) are now routinely being used to study a wide variety of material and process related problems.ESCA, which has become a standard analytical tool in the chemical industry, has not been utilized in the microelectronic industry to the extent that AES and SIMS have, even though it has the potential to provide more chemical state and structural information than other surface analysis techniques.ESCA like the other surface analysis techniques analyzes the outermost atomic layers of a solid surface (typically 5 to 50 Å in depth). A low energy X-ray source (Mg 1253.6 eV or Al 1486.7 eV) is used to bombard the sample causing electrons to be ejected from it. These photo-electrons are collected and analyzed to determine their kinetic energy.


2015 ◽  
Vol 64 (7) ◽  
pp. 285-288
Author(s):  
Kenji Nose ◽  
Mai Tomino

2009 ◽  
Vol 15 (S3) ◽  
pp. 87-88
Author(s):  
José A. R. Pacheco de Carvalho ◽  
Cláudia F. F. P. R. Pacheco ◽  
António D. Reis

AbstractMaterial analysis, specially surface analysis of materials, has been increasingly important. A wide range of surface analysis techniques is available. The techniques are, generally, complementary. There are nuclear and non-nuclear techniques, e.g. microscopy. Nuclear techniques, which are nondestructive, permit analysis for a few microns near the surface. They have been applied to areas such as scientific, technologic, industry, arts and medicine, using MeV ion beams. Nuclear reactions permit to achieve high sensitivities for detection of light elements in heavy substrates and also discrimination of isotopes. We use ion-ion nuclear reactions, elastic scattering and the energy analysis method, where an energy spectrum is obtained of ions from the target for a chosen energy of the incident ion beam. The target composition and concentration profile information contained in the spectrum is computationally obtained through a computer program that has been developed for predicting such energy spectra. Predicted spectra obtained for variations of target parameters are compared with experimental data, giving that information. SEM and TEM are also used.


1981 ◽  
Vol 18 (3) ◽  
pp. 960-964 ◽  
Author(s):  
L. L. Kazmerski ◽  
O. Jamjoum ◽  
P. J. Ireland ◽  
R. L. Whitney

1988 ◽  
Vol 22 (4) ◽  
pp. 463-467 ◽  
Author(s):  
Julia E. Fulghum ◽  
Scott R. Bryan ◽  
Richard W. Linton ◽  
Christopher F. Bauer ◽  
Dieter P. Griffis

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