scholarly journals Advantages and Limitations of Surface Analysis Techniques on Plasma-Treated Arabidopsis thaliana Seeds

2021 ◽  
Vol 8 ◽  
Author(s):  
Alexandra Waskow ◽  
Alan Howling ◽  
Ivo Furno
Keyword(s):  
Contact Angle ◽  
Arabidopsis Thaliana ◽  
Surface Analysis ◽  
Photoelectron Spectroscopy ◽  
Surface Characterization ◽  
Attenuated Total Reflection ◽  
X Ray ◽  
Force Microscopy ◽  
Analysis Techniques ◽  
Surface Analysis Techniques

Surface characterization of plasma-treated seeds has made significant progress over the last decade. Most papers in the literature use scanning electron microscopy (SEM) and contact angle goniometry to investigate surface modifications. However, very few papers address the chemical modifications to the seed coat after plasma treatment. Here, a summary of the methods used to analyze plasma-treated seeds is presented, such as SEM, contact angle goniometry, energy-dispersive X-ray spectroscopy (EDX), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR). The results obtained on Arabidopsis thaliana Col-0 seeds and the limitations of these techniques are discussed. An experiment was designed in order to compare the relative advantages and limitations of these surface analysis techniques by investigating the separate effects of plasma, heat, and ozone on A. thaliana seeds.

ESCA for microelectronic applications

1983 ◽  
Vol 41 ◽  
pp. 168-169
Author(s):  
J. F. Moulder ◽  
J. M. Burkstrand ◽  
C. D. Wagner
Keyword(s):  
Surface Analysis ◽  
Photoelectron Spectroscopy ◽  
Structural Information ◽  
Ion Scattering ◽  
X Ray ◽  
Analysis Techniques ◽  
Microelectronic Devices ◽  
Surface Analysis Techniques ◽  
Ion Scattering Spectroscopy ◽  
Secondary Ion

As the dimensions of microelectronic devices continue to shrink, the use of surface sensitive analysis techniques to characterize thin film structures continues to grow. These techniques including: ESCA or XPS (X-ray photoelectron spectroscopy), AES (Auger electron spectroscopy), SIMS (secondary ion mass spectroscopy) and ISS (ion scattering spectroscopy) are now routinely being used to study a wide variety of material and process related problems.ESCA, which has become a standard analytical tool in the chemical industry, has not been utilized in the microelectronic industry to the extent that AES and SIMS have, even though it has the potential to provide more chemical state and structural information than other surface analysis techniques.ESCA like the other surface analysis techniques analyzes the outermost atomic layers of a solid surface (typically 5 to 50 Å in depth). A low energy X-ray source (Mg 1253.6 eV or Al 1486.7 eV) is used to bombard the sample causing electrons to be ejected from it. These photo-electrons are collected and analyzed to determine their kinetic energy.

Surface Characterization of Electrochemically Fabricated CuO Doped ZnO Thin Film

2005 ◽  
Vol 277-279 ◽  
pp. 972-976
Author(s):  
Jang Hee Yoon ◽  
Yoon Bo Shim ◽  
Chae Ryong Cho ◽  
Mi Sook Won
Keyword(s):  
Photoelectron Spectroscopy ◽  
Surface Characterization ◽  
Reference Electrode ◽  
Cathodic Current ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Zn Concentration ◽  
Solution Doping

In this study, ZnO and CuO doped zinc oxide thin films were cathodically deposited in aqueous zinc chloride solutions in the presence of oxygen on a Pt/Ti/SiO2/Si substrate through an electrochemical reaction. A mercurous sulfate electrode was used as a reference electrode and the counter electrode was a Pt spiral wire. Deposition was carried out in solutions containing Zn2+ ions introduced as ZnCl2 salt at concentrations ranging from 5.0 x 10-4 to 5.0 x 10-2 M. The bath temperatures were controlled from 65°C to 80°C. The oxygen gas was introduced from argon/oxygen mixtures allowing its partial pressure to be fixed along with its concentration in the solution. Doping of CuO was carried out in cupric nitrate or a cupric chloride/0.1M KCl solution. The influence of the Cu/Zn concentration, deposition temperature of a solution, applied cathodic potential and deposition time were optimized. After the potential was applied, the cathodic current reached a steady state within 5 min. The composition, and the characterization of the surface of the films were investigated through X-ray diffractometry, X-ray photoelectron spectroscopy, atomic force microscopy and scanning electron microscopy.

Chemical Wear of Cu CMP

2000 ◽  
Vol 613 ◽  
Author(s):  
Hong Liang
Keyword(s):  
Copper Oxide ◽  
Surface Analysis ◽  
Field Emission ◽  
Wear Mechanisms ◽  
Abrasive Particles ◽  
X Ray ◽  
Analysis Techniques ◽  
Analytical Tem ◽  
Surface Analysis Techniques ◽  
Cu Cmp

In this work, we used surface analysis techniques, such as a field-emission highresolution analytical TEM, X-ray spectroscopy, and XPS to analyze abrasive particles after polishing. Results showed evidence of copper oxide (Cu2O) in the polished slurry. However, there was no metallic crystalline copper detected. After comparing these data with the results obtained from our electro-chemical experiments, we propose two possible chemical wear mechanisms in Cu CMP.

scholarly journals Synthesis and Characterization of Ag2S Layers Formed on Polypropylene

2013 ◽  
Vol 2013 ◽  
pp. 1-11 ◽  
Author(s):  
Valentina Krylova ◽  
Nijolė Dukštienė
Keyword(s):  
Photoelectron Spectroscopy ◽  
Precursor Solution ◽  
Attenuated Total Reflection ◽  
Thiamine Hydrochloride ◽  
X Ray Diffraction ◽  
Spectra Analysis ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Silver Sulphide

Silver sulphide, Ag2S, layers on the surface of polypropylene (PP) film was formed by chemical bath deposition method (CBD). Film samples were characterised by X-ray photoelectron spectroscopy (XPS), attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), and X-ray diffraction analysis (XRD). The surface morphology, texture, and uniformity of the silver sulphide layers were formed on PP surface dependent on the number of polymer immersions in the precursor solution. XPS analysis confirmed that on the surface of the polypropylene film, a layer of Ag2S was formed. ATR-FTIR and FTIR spectra analysis showed that the surface of Ag2S layers is slightly oxidized. All prepared layers gave multiple XRD reflections, corresponding to monoclinic Ag2S (acanthite). The Ag2S layer on polypropylene was characterized as an Ag+ion selective electrode in terms of potential response and detection limit. The electrode was also tested as an end-point electrode for argentometric titration of thiamine hydrochloride.

scholarly journals Inhibition mechanism of Ca 2+ , Mg 2+ and Fe 3+ in fine cassiterite flotation using octanohydroxamic acid

2018 ◽  
Vol 5 (8) ◽  
pp. 180158 ◽  
Author(s):  
Liuyi Ren ◽  
Hang Qiu ◽  
Wenqing Qin ◽  
Ming Zhang ◽  
Yubiao Li ◽  
...  
Keyword(s):  
Contact Angle ◽  
Photoelectron Spectroscopy ◽  
Chemical Properties ◽  
Solution Chemistry ◽  
Inhibition Mechanism ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Afm Imaging ◽  
Flotation Performance

The existence of metal ions should not be ignored in both hydrometallurgy and flotation. In this study, the effects of Ca 2+ , Mg 2+ and Fe 3+ on the flotation performance of cassiterite using octanohydroxamic acid (OHA) as the collector were investigated by micro-flotation tests, X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, contact angle, zeta ( ζ ) potential measurements and atomic force microscopy (AFM) imaging. The results of the flotation and contact angle experiments showed that the addition of Ca 2+ , Mg 2+ and Fe 3+ significantly decreased both the recovery and contact angle of cassiterite with pH ranged from 6.0 to 12.0 in the presence of OHA collector. ζ- Potential measurements, solution chemistry analysis and FTIR measurements indicated that the flotation recovery of the cassiterite declined due to the CaOH + , MgOH + and Fe(OH) 3 sites on the cassiterite surface. XPS results indicated that the chemisorption of OHA and calcium ions on the cassiterite surface finally changed its chemical properties. The AFM images also revealed that new species Fe(OH) 3 of Fe 3+ formed and adsorbed on the cassiterite surface at pH 9.0. The adsorption of Fe(OH) 3 reduced the adsorption of OHA on the cassiterite surface, thus the hydrophobicity of cassiterite was deteriorated.

scholarly journals Surface Modification of Polyethersulfone (PES) with UV Photo-Oxidation

Technologies ◽  
2021 ◽  
Vol 9 (2) ◽  
pp. 36
Author(s):  
Ibrahim Cisse ◽  
Sarah Oakes ◽  
Shreen Sachdev ◽  
Marc Toro ◽  
Shin Lutondo ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Contact Angle ◽  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
Water Contact ◽  
X Ray ◽  
Force Microscopy ◽  
Photo Oxidation ◽  
Atomic Force ◽  
Modified Surfaces

Polyethersulfone (PES) films are widely employed in the construction of membranes where there is a desire to make the surface more hydrophilic. Therefore, UV photo-oxidation was studied in order to oxidize the surface of PES and increase hydrophilicity. UV photo-oxidation using low pressure mercury lamps emitting both 253.7 and 184.9 nm radiation were compared with only 253.7 nm photons. The modified surfaces were characterized using X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and water contact angle (WCA) measurements. Both sets of lamps gave similar results, showing an increase of the oxygen concentration up to a saturation level of ca. 29 at.% and a decrease in the WCA, i.e., an increase in hydrophilicity, down to ca. 40°. XPS detected a decrease of sp2 C-C aromatic group bonding and an increase in the formation of C-O, C=O, O=C-O, O=C-OH, O-(C=O)-O, and sulphonate and sulphate moieties. Since little change in surface roughness was observed by AFM, the oxidation of the surface caused the increase in hydrophilicity.

Surface Changes after Silver Formation on a Precoated Surface with Polyaniline for Textile Metallization

2012 ◽  
Vol 441 ◽  
pp. 304-308
Author(s):  
Ya Ping Zhao ◽  
Zai Sheng Cai ◽  
Xiao Lan Fu
Keyword(s):  
Photoelectron Spectroscopy ◽  
Atomic Emission ◽  
Attenuated Total Reflection ◽  
Metallic Elements ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Before And After ◽  
Ag Deposition ◽  
Surface Changes

Silver (Ag) deposition was performed on a polyaniline-precoated surface for textile metallization. Polyaniline was utilized as an intermediate layer on fabrics to facilitate Ag formation. Inductivily coupled plasma atomic emission spectgrometry (ICP-AES) was used to monitor the content of metallic elements on Ag-laden polyaniline layers prepared under different conditions of polyaniline fomation. The surface modification of the samples before and after Ag plating was characterized by attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR), X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM) and atomic force microscopy (AFM).

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