Towards Stabilized 10% Efficiency of Large-Area (> 5000cm2) a-Si/a-SiGe Tandem Solar Cells using High-Rate Deposition

ABSTRACTThis paper reviews recent progress in large-area a-Si/a-SiGe tandem solar cells in Sanyo. Much effort has been devoted to increasing both the stabilized efficiency and the process throughput. A key issue in increasing the stabilized efficiency is thinner i-layer structure with an improved optical confinement effect. High-rate deposition of the i-layers has been investigated using rf (13.56MHz) plasma-CVD method while keeping the substrate temperature below 200 °C. A high photosensitivity of 106 of a-Si:H films maintain up to the deposition rate (Rd) of 15 Å/s by optimizing hydrogen dilution and other deposition conditions. It is of great importance to utilize the effect of hydrogen dilution which can reduce the incorporation of excess hydrogen in the films. The world's highest conversion efficiency of 11.2% has been achieved for a large-area (8252cm2) a-Si/a-SiGe tandem by combining the optimized hydrogen dilution and other solar cell related technologies.

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High-rate deposition of microcrystalline silicon in a large-area PECVD reactor and integration in tandem solar cells

Progress in Photovoltaics Research and Applications ◽

10.1002/pip.961 ◽

2010 ◽

pp. n/a-n/a ◽

Cited By ~ 1

Author(s):

Gaetano Parascandolo ◽

Grégory Bugnon ◽

Andrea Feltrin ◽

Christophe Ballif

Keyword(s):

Solar Cells ◽

High Rate ◽

Microcrystalline Silicon ◽

Large Area ◽

Tandem Solar Cells

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Toward stabilized 10% efficiency of large-area (>5000cm2) a-Si/a-SiGe tandem solar cells using high-rate deposition

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(02)00093-4 ◽

2002 ◽

Vol 74 (1-4) ◽

pp. 339-349 ◽

Cited By ~ 29

Author(s):

Eiji Maruyama ◽

Shingo Okamoto ◽

Akira Terakawa ◽

Wataru Shinohara ◽

Makoto Tanaka ◽

...

Keyword(s):

Solar Cells ◽

High Rate ◽

Large Area ◽

Tandem Solar Cells

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Panasonic’s Thin Film Silicon Technologies for Advanced Photovoltaics

MRS Proceedings ◽

10.1557/opl.2013.596 ◽

2013 ◽

Vol 1536 ◽

pp. 17-26 ◽

Cited By ~ 5

Author(s):

Akira Terakawa ◽

Hiroko Murayama ◽

Yohko Naruse ◽

Hirotaka Katayama ◽

Takeyuki Sekimoto ◽

...

Keyword(s):

Solar Cells ◽

High Efficiency ◽

High Rate ◽

Plasma Confinement ◽

Plasma Cvd ◽

Tandem Solar Cells ◽

Plasma Diagnosis ◽

Wafer Thickness ◽

Very High ◽

Si Wafer

ABSTRACTWe have fabricated high-efficiency a-Si/µc-Si tandem solar cells and modules with a very high µc-Si deposition rate using Localized Plasma Confinement CVD to give very high-rate deposition (>2.0 nm/s) of device-grade µc-Si layers. For further progress in productive plasma-CVD techniques, we have studied plasma phenomena by combining newly developed plasma simulation and plasma diagnosis techniques that reveal the importance of non-emissive atomic hydrogen. We also have proposed a model of defective µc-Si formation on highly textured substrates in which the atomic H in plasma is assumed to play an important role. We are also developing a non-vacuum deposition technique that we term “Liquid Si Printing.” A new record conversion efficiency for HIT solar cells of 24.7% has been achieved using a very thin c-Si wafer (Thickness: 98 µm, Area: 102 cm2).

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Four-terminal perovskite/silicon tandem solar cells based on large-area perovskite solar cells utilizing low-cost copper semi-transparent electrode

Applied Physics A ◽

10.1007/s00339-021-05234-w ◽

2022 ◽

Vol 128 (2) ◽

Author(s):

Manas R. Samantaray ◽

Dhriti S. Ghosh ◽

Nikhil Chander

Keyword(s):

Solar Cells ◽

Low Cost ◽

Perovskite Solar Cells ◽

Transparent Electrode ◽

Large Area ◽

Tandem Solar Cells

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Large-scale, high-efficiency thin-film silicon solar cells fabricated by short-pulsed plasma CVD method

Solar Energy Materials and Solar Cells ◽

10.1016/j.solmat.2005.10.027 ◽

2006 ◽

Vol 90 (18-19) ◽

pp. 3416-3421 ◽

Cited By ~ 7

Author(s):

Y. Fujioka ◽

A. Shimizu ◽

H. Fukuda ◽

T. Oouchida ◽

S. Tachibana ◽

...

Keyword(s):

Thin Film ◽

Solar Cells ◽

Large Scale ◽

High Efficiency ◽

Silicon Solar Cells ◽

Pulsed Plasma ◽

Plasma Cvd ◽

Cvd Method ◽

Thin Film Silicon

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Large-Area Hydrogenated Amorphous and Microcrystalline Silicon Double-Junction Solar Cells

MRS Proceedings ◽

10.1557/proc-808-a9.41 ◽

2004 ◽

Vol 808 ◽

Cited By ~ 5

Author(s):

Baojie Yan ◽

Guozhen Yue ◽

Arindam Banerjee ◽

Jeffrey Yang ◽

Subhendu Guha

Keyword(s):

Solar Cells ◽

Deposition Time ◽

High Rate ◽

Microcrystalline Silicon ◽

Large Area ◽

Area Efficiency ◽

Rf Glow Discharge ◽

Double Junction ◽

Junction Structure ◽

Hydrogenated Amorphous

ABSTRACTHydrogenated amorphous silicon (a-Si:H) and hydrogenated microcrystalline silicon ( c-Si:H) double-junction solar cells were deposited on a large-area substrate using a RF glow discharge technique at various rates. The thickness uniformity for both a-Si:H and c-Si:H is well within ± 10% and the reproducibility is very good. Preliminary results from the large-area a-Si:H/m c-Si:H double-junction structures show an initial aperture-area efficiency of 11.8% and 11.3%, respectively, for 45 cm2 and 461 cm2 size un-encapsulated solar cells. The 11.3% cell became 10.6% after encapsulation and stabilized at 9.5% after prolonged light soaking under 100 mW/cm2 of white light at 50°C. High rate deposition of the c-Si:H layer in the bottom cell was made using the high-pressure approach. An initial active-area (0.25 cm2) efficiency of 11.3% was achieved using an a-Si:H/m c-Si:H double-junction structure with 50 minutes of c-Si:H deposition time.

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