scholarly journals Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering

2010 ◽  
Vol 13 (1-2) ◽  
pp. 81 ◽  
Author(s):  
P. Karuna Purnapu Rupa ◽  
P.C. Chakraborti ◽  
Suman K. Mishra
Keyword(s):  
Mechanical Properties ◽  
Boron Nitride ◽  
Magnetron Sputtering ◽  
Critical Load ◽  
Reactive Magnetron ◽  
Instrumented Indentation ◽  
Indentation Technique ◽  
Load To Failure ◽  
Indentation Response ◽  
Depth Curves

<p>Titanium-boron-nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using a single TiB<sub>2</sub> target. The films were deposited under different Ar:N<sub>2</sub> ratios. The instrumented indentation technique (nanoindentation), is used to evaluate the mechanical properties of the films. A methodology is presented to evaluate the critical load to failure directly from the load depth curves. Significant effect of Ar:N<sub>2</sub> ratio was observed on the mechanical properties of the Ti-B-N films.</p>

Microstructure and mechanical properties of W-C:H coatings deposited by pulsed reactive magnetron sputtering

2011 ◽  
Vol 205 (19) ◽  
pp. 4471-4479 ◽  
Author(s):  
Andrzej Czyżniewski ◽  
Witold Gulbiński ◽  
György Radnóczi ◽  
Marianna Szerencsi ◽  
Mieczysław Pancielejko
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Microstructure And Mechanical Properties

scholarly journals Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering

2015 ◽  
Vol 18 (suppl 2) ◽  
pp. 30-34 ◽  
Author(s):  
Flávio Gustavo Ribeiro Freitas ◽  
Roberto Hübler ◽  
Gabriel Soares ◽  
Amanda Gardênia Santos Conceição ◽  
Edson Reis Vitória ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron
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