The maskless photolithography device we developed requires no photomask, by modifying Liquid Crystal Display (LCD) projector optics from magnified to reduced projection. The second-generation device we developed produces a practical centimeter-scale micropattern by dividing a large mask pattern and divisionally exposing it synchronized with an auto-XY stage, applying it to cellmicropattern and microfluidic device production. Although advantageous in producing maskless micropatterns, problems arise in jagged pattern boundaries due to the liquid crystal panel structure and collapse pattern of the boundary divided on divisional exposure using the auto-XY stage. The third-generation maskless photolithography device we developed had a more accurate auto-XY stage and solved problems caused by hardware through software such as control of the auto-XY stage.
MICROFABRICATION TECHNOLOGY OF POLYMERIC MICROFLUIDIC DEVICE