scholarly journals Inhibition Effect of 3D Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayers on Copper in Nacl Solution

2018 ◽  
Author(s):  
Shuai Hu ◽  
Zhenyu Chen ◽  
Xingpeng Guo
Keyword(s):  
Corrosion Resistance ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Nacl Solution ◽  
Simple Method ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Bare Copper ◽  
3D Nanostructure ◽  
Anticorrosion Properties

A novel and simple method to improve the corrosion resistance of copper by constructing a 3D 1-dodecanethiol self-assembled monolayers (SAMs) in 3.5% NaCl solution is reported in this study. Several drops of 1% H3PO4 solution are thinly and uniformly distributed on copper surface to form a 3D nanostructure constituted by Cu3(PO4)2 nanoflowers. The anticorrosion properties of 1-dodecanethiol SAMs on copper surface and on copper surface treated with H3PO4 solution were evaluated. Results demonstrated that 1-dodecanethiol SAMs on bare copper surface exhibit good protection capacity, whereas a copper surface pretreated with H3PO4 solution can substantially enhance the corrosion resistance of 1-dodecanethiol SAMs.

scholarly journals Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution

Materials ◽  
2018 ◽  
Vol 11 (7) ◽  
pp. 1225 ◽  
Author(s):  
Shuai Hu ◽  
Zhenyu Chen ◽  
Xingpeng Guo
Keyword(s):  
Corrosion Resistance ◽  
Three Dimensional ◽  
Copper Surface ◽  
Nacl Solution ◽  
Self Assembled Monolayer ◽  
Simple Method ◽  
Self Assembled ◽  
Bare Copper ◽  
3D Nanostructure ◽  
Anticorrosion Properties

A novel and simple method to improve the corrosion resistance of copper by constructing a three-dimensional (3D) 1-dodecanethiol self-assembled monolayer (SAM) in 3.5% NaCl solution is reported in this study. Several drops of 1% H3PO4 solution are thinly and uniformly distributed on copper surface to form a 3D nanostructure constituted by Cu3(PO4)2 nanoflowers. The anticorrosion properties of 1-dodecanethiol SAM on copper surface and on copper surface that is treated with H3PO4 solution were evaluated. Results demonstrated that 1-dodecanethiol SAM on bare copper surface exhibits good protection capacity, whereas a copper surface that is pretreated with H3PO4 solution can substantially enhance the corrosion resistance of 1-dodecanethiol SAM.

Copper surface protection by organothiol self-assembled monolayers

2015 ◽  
Vol 1746 ◽  
Author(s):  
Sira Suren ◽  
Supattra Haokratoke ◽  
Soorathep Kheawhom
Keyword(s):  
Corrosion Inhibition ◽  
Coating Layer ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Oxygen Plasma Treatment ◽  
Water Contact ◽  
Surface Protection ◽  
Assembled Monolayers ◽  
Forming Temperature ◽  
Self Assembled

ABSTRACTThis work investigates the effects of concentration of organothiol molecules and temperature used during self-assembled monolayers (SAMs) formation on quality of the organothiol SAMs coating layer obtained in terms of wettability, corrosion inhibition efficiency and carbon to copper ratio. The organothiol SAMs were coated on copper substrates prepared by electro-polishing followed by oxygen plasma treatment for 15 s. Three types of organothiol SAMs including 1-octanethiol (OTT), 2-ethylhexanethiol (2-EHT) and 2-phenylethanethiol (2-PET) were investigated. Concentration of organothiol molecules ranging from 0.005 to 0.02 M in isopropanol and forming temperature ranging from -15 to 50°C were studied. It was found that all organothiol SAMs of 0.01 M provided the SAMs coating layer with the highest quality. The SAMs formed at 40°C with OTT and 2-EHT, and at 0°C with 2-PET were the most favorable condition with the highest water contact angle of 124.79o, 130.66o and 120.58o at corrosion inhibition efficiencies of 96.24%, 99.37% and 98.90%, respectively.

scholarly journals Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

2012 ◽  
Vol 3 ◽  
pp. 101-113 ◽  
Author(s):  
Zhe She ◽  
Andrea DiFalco ◽  
Georg Hähner ◽  
Manfred Buck
Keyword(s):  
Electron Beam ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Metal Structures ◽  
Step Procedure ◽  
Assembled Monolayers ◽  
Polycrystalline Gold ◽  
Self Assembled ◽  
Lift Off ◽  
Surface Morphologies

Self-assembled monolayers (SAMs) of 4'-methylbiphenyl-4-thiol (MBP0) adsorbed on polycrystalline gold substrates served as templates to control electrochemical deposition of Cu structures from acidic solution, and enabled the subsequent lift-off of the metal structures by attachment to epoxy glue. By exploiting the negative-resist behaviour of MBP0, the SAM was patterned by means of electron-beam lithography. For high deposition contrast a two-step procedure was employed involving a nucleation phase around −0.7 V versus Cu2+/Cu and a growth phase at around −0.35 V versus Cu2+/Cu. Structures with features down to 100 nm were deposited and transferred with high fidelity. By using substrates with different surface morphologies, AFM measurements revealed that the roughness of the substrate is a crucial factor but not the only one determining the roughness of the copper surface that is exposed after lift-off.

scholarly journals Improvement of Corrosion Resistance of Electroless Au/Ni-P Layer using Self-assembled Monolayers of 1-octadecanethiol

2012 ◽  
Vol 63 (9) ◽  
pp. 585 ◽  
Author(s):  
Kazuhide ONO ◽  
Tadashi KURASHINA ◽  
Yuta NATORI ◽  
Koji TAKAHASHI ◽  
Yuji NONAGASE ◽  
...  
Keyword(s):  
Corrosion Resistance ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Self-Assembled Monolayers of Schiff Base on the Surfaces of Oxidized Copper

2008 ◽  
Vol 373-374 ◽  
pp. 649-653
Author(s):  
Dang Gang Li ◽  
Xian Jin Yu ◽  
Y.H. Dong ◽  
L.P. Zhang ◽  
Zeng Dian Zhao
Keyword(s):  
Schiff Base ◽  
Photoelectron Spectroscopy ◽  
Copper Surface ◽  
The Self ◽  
Polarization Curves ◽  
Self Assembled Monolayers ◽  
Surface Films ◽  
Assembled Monolayers ◽  
Interface Capacitance ◽  
Self Assembled

The Self-assembled monolayers (SAMs) of Schiff base had been formed on oxidized surfaces of copper. Schiff base used in this paper is N-2-hydroxyphenyl- (3-methoxy-salicylidenimine), designated V-bso. X-ray photoelectron spectroscopy (XPS), polarization curves, electrochemistry impedance spectroscopy (EIS) and the interface capacitance measurements have been employed to investigate the structure, formation and composition of these monolayers. XPS analysis show that the valence of the copper in the surface films is +2. The polarization curves and the EIS results indicate that the films of CuO, V-bso, and V-bso modified oxidized copper all have good corrosion inhibition efficiency. The IE of the V-bso modified oxidized copper is higher than that of the V-bso modified copper and the oxidized copper layer, just because the former has two layers. The results of the interface capacitance show that the self-assemble films of the V-bso on the oxidized copper surface have good potential stability.

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