scholarly journals A spectroscopic investigation of 12-tungstophosphoric acid alkali salts

2000 ◽  
Vol 65 (5-6) ◽  
pp. 399-406 ◽  
Author(s):  
Ubavka Mioc ◽  
Marija Todorovic ◽  
Snezana Uskokovic-Markovic ◽  
Zoran Nedic ◽  
Nada Bosnjakovic

In this paper the latest results of our continuing investigation of heteropoly acids and their salts are reported. Specially attention was paid to the influence of cations on the dynamic equilibrium of protonic species, as well as on the structure of the host lattice itself, i.e., the Keggin anions. The investigations were done by IR and Raman spectroscopy within the range of 1200.40 cm-1.

2000 ◽  
Vol 65 (5-6) ◽  
pp. 407-415 ◽  
Author(s):  
Ubavka Mioc ◽  
Marija Todorovic ◽  
Snezana Uskokovic-Markovic ◽  
Zoran Nedic ◽  
Vojislav Stamenkovic ◽  
...  

In this paper local processes and structural phase transformations of the copper salt of 12-tungstophosphoric acid are investigated. The structural phase transformations were followed through bands, characteristic for the host lattice, in the IR and Raman spectra. The results of these investigations, as well as those of XRPD analysis and impedance measurements as a function of temperature show that some local processes provoke the change in the secondary structure of the Keggin anions.


2005 ◽  
Vol 39 (2) ◽  
pp. 249-256 ◽  
Author(s):  
Hartwig Schulz ◽  
Gülcan Özkan ◽  
Malgorzata Baranska ◽  
Hans Krüger ◽  
Musa Özcan

Author(s):  
K. Antonova ◽  
P. Byshewski ◽  
G. Zhizhin ◽  
J. Piechota ◽  
M. Marhevka

Author(s):  
D. Jay Anderson ◽  
Mustafa Kansiz ◽  
Michael Lo ◽  
Eoghan Dillon ◽  
Curtis Marcott

Abstract Rapid identification of organic contamination in the semi and semi related industry is a major concern for research and manufacturing. Organic contamination can affect a system or subsystem’s performance and cause premature failure of the product. As an example, in February 2019 the Taiwan Semiconductor Manufacturing Company (TMSC), a major semiconductor manufacturer, reported that a photoresist it used included a specific element which was abnormally treated, creating a foreign polymer in the photoresist resulting in an estimated loss of $550M [1].


2001 ◽  
Vol 596 (1-3) ◽  
pp. 151-156 ◽  
Author(s):  
P. Pasierb ◽  
S. Komornicki ◽  
M. Rokita ◽  
M. Rȩkas

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