scholarly journals Sputter-deposited Films from Ti-Ni Target and NaCl Substrate Prepared by Pulsed-current Sintering.

2007 ◽  
Vol 54 (2) ◽  
pp. 107-111
Author(s):  
Keizo Kobayashi ◽  
Kimihiro Ozaki ◽  
Masashi Mikami ◽  
Yukio Ishikawa
Keyword(s):  
Pulsed Current ◽  
Sputter Deposited ◽  
Deposited Films

scholarly journals Texture-related roughness of (Nb,Ti)N sputter-deposited films

2003 ◽  
Vol 13 (2) ◽  
pp. 3301-3304 ◽  
Author(s):  
N.N. Iosad ◽  
N.M. van der Pers ◽  
S. Grachev ◽  
M. Zuiddam ◽  
B.D. Jackson ◽  
...  
Keyword(s):  
Sputter Deposited ◽  
Deposited Films

Residual Stress, Fracture, and Adhesion in Sputter-Deposited Molybdenum Films

1988 ◽  
Vol 119 ◽  
Author(s):  
D. M. Mattox ◽  
R. E. Cuthrell
Keyword(s):  
Residual Stress ◽  
Strain Energy ◽  
Pressure Cycling ◽  
Stress Anisotropy ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Film Substrate ◽  
Deposited Films ◽  
Deposition Conditions

AbstractAtomistically deposited films may form with high residual stresses which may be either tensile or compressive in nature. These film stresses represent stored strain energy which may affect the adhesion of the film-substrate couple and in the limit may cause spontaneous fracture at or near the film-substrate interface (loss of adhesion). In the post cathode magnetron sputter deposition of molybdenum films, we have found that the intrinsic film stresses are generally anisotropic and may easily exceed the fracture or adhesive strength of the film-substrate couple. The residual stress anisotropy in the film is dependent on the orientation with respect to the post cathode and the magnitude and nature of the stresses are very dependent on the deposition conditions, particularly gas pressure during sputtering. By using a pressure-cycling technique, we have deposited thick (5 microns) films of molybdenum which have little residual stress or stress anisotropy.

Microstructure and Composition Design of Magnetic Ni-Mn-Sn Co-sputter Deposited Films

2015 ◽  
Vol 6 (6) ◽  
pp. 476-482
Author(s):  
A. Quintana-Nedelcos ◽  
J. Sanchez-Llamazares ◽  
T. García-Fernández ◽  
S. Guvenc ◽  
M. Yumak ◽  
...  
Keyword(s):  
Composition Design ◽  
Sputter Deposited ◽  
Deposited Films

Ion-Assisted Deposition of CaF2 Films on (111) Si

1992 ◽  
Vol 268 ◽  
Author(s):  
J.G. Cook ◽  
H. Moeller ◽  
S.R. Das ◽  
Li Zhongming
Keyword(s):  
Optical Properties ◽  
Emission Spectroscopy ◽  
Rf Discharge ◽  
Electrical And Optical Properties ◽  
Sputter Deposited ◽  
Deposited Films ◽  
Better Than

ABSTRACTCaF2 films have been deposited by evaporation onto H-passivated (111) Si in the presence of an rf discharge. The discharge is seen to promote epitaxy. Emission spectroscopy reveals strong CaF2 bands and a weak Ca line, indicating that deposition is largely molecular but that some breakup of the CaF2 molecules occurs in the discharge. Electrical and optical properties of these films were substantially better than those of sputter-deposited films.

Profiling of carbon, oxygen and argon contamination in sputter-deposited films using nuclear backscattering and nuclear reaction spectroscopy

1991 ◽  
Vol 48-49 ◽  
pp. 215-221 ◽  
Author(s):  
A. Chevarier ◽  
N. Chevarier ◽  
M. El Bouanani ◽  
E. Gerlic ◽  
M. Stern ◽  
...  
Keyword(s):  
Nuclear Reaction ◽  
Sputter Deposited ◽  
Deposited Films

Structure and magnetic properties of FenCrnN sputter-deposited films

1997 ◽  
Vol 172 (1-2) ◽  
pp. 41-52 ◽  
Author(s):  
D.L. Peng ◽  
T.J. Konno ◽  
K. Sumiyama ◽  
H. Onodera ◽  
K. Suzuki
Keyword(s):  
Magnetic Properties ◽  
Sputter Deposited ◽  
Deposited Films

Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals

2012 ◽  
Vol 258 (15) ◽  
pp. 5707-5711 ◽  
Author(s):  
Nicolau Molina Bom ◽  
Gabriel Vieira Soares ◽  
Cristiano Krug ◽  
Rafael Peretti Pezzi ◽  
Israel Jacob Rabin Baumvol ◽  
...  
Keyword(s):  
Sputter Deposited ◽  
Deposited Films

Ultra-flat platinum surfaces from template-stripping of sputter deposited films

2003 ◽  
Vol 546 (2-3) ◽  
pp. 87-96 ◽  
Author(s):  
Jason J Blackstock ◽  
Zhiyong Li ◽  
Mark R Freeman ◽  
Duncan R Stewart
Keyword(s):  
Platinum Surfaces ◽  
Template Stripping ◽  
Sputter Deposited ◽  
Deposited Films
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