About Nucleation on the Line of a Three-Phase Contact of a Vapor–Liquid–Solid During the Growth of Nanowires

2020 ◽  
Vol 55 (1) ◽  
pp. 32-37
Author(s):  
A. Yu. Vorob’ev ◽  
V. A. Nebol’sin ◽  
N. Swaikat ◽  
V. A. Yuriev
1999 ◽  
Vol 96 (9) ◽  
pp. 1335-1339 ◽  
Author(s):  
ALAN E. VAN GIESSEN, DIRK JAN BUKMAN, B.

1998 ◽  
Vol 536 ◽  
Author(s):  
N. Ozaki ◽  
Y. Ohno ◽  
S. Takeda ◽  
M. Hirata

AbstractWe have grown Si nanowhiskers on a Si{1111} surface via the vapor-liquid-solid (VLS) mechanism. The minimum diameter of the crystalline is 3nm and is close to the critical value for the effect of quantum confinement. We have found that many whiskers grow epitaxially or non-epitaxially on the substrate along the 〈112〉 direction as well as the 〈111〉 direction.In our growth procedure, we first deposited gold on a H-terminated Si{111} surface and prepared the molten catalysts of Au and Si at 500°C. Under the flow of high pressure silane gas, we have succeeded in producing the nanowhiskers without any extended defects. We present the details of the growth condition and discuss the growth mechanism of the nanowhiskers extending along the 〈112〉 direction.


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