Spectra and Kinetics of Emission in Polycrystalline Er2O3 under Pulsed Laser-Thermal Excitation

2021 ◽  
Vol 29 (4) ◽  
pp. 293-298
Author(s):  
V. M. Marchenko
Keyword(s):  
Pulsed Laser ◽  
Thermal Excitation ◽  
Kinetics Of

Spectra and Kinetics of YAG:0.5%Er3+ Radiation Under Pulsed Laser Thermal Excitation

2017 ◽  
Vol 84 (5) ◽  
pp. 751-756
Author(s):  
V. M. Marchenko ◽  
M. A. Melkumov ◽  
Yu. A. Shakir
Keyword(s):  
Pulsed Laser ◽  
Thermal Excitation ◽  
Kinetics Of

Kinetics of Recycling CF/EP Composites by Thermal Excitation of Cr2O3

2019 ◽  
Vol 27 (9) ◽  
pp. 1937-1947
Author(s):  
Huanbo Cheng ◽  
Yu Sun ◽  
Ziqiang Zhou ◽  
Jie Zhang ◽  
Xin Wang ◽  
...  
Keyword(s):  
Thermal Excitation ◽  
Kinetics Of

Image formation mechanism in PMMA-MAA antracene positive photoresist exposed by pulsed laser and kinetics of its development

1990 ◽  
Author(s):  
Alexei L. Bogdanov ◽  
V. A. Nikitaev ◽  
Andrey B. Poljakov ◽  
V. E. Tukish ◽  
Kamil A. Valiev ◽  
...  
Keyword(s):  
Formation Mechanism ◽  
Pulsed Laser ◽  
Image Formation ◽  
Positive Photoresist ◽  
Kinetics Of

scholarly journals Oxygen in Complex Oxide Thin Films Grown by Pulsed Laser Deposition: a Perspective

2019 ◽  
Vol 33 (1) ◽  
pp. 205-212 ◽  
Author(s):  
Gertjan Koster ◽  
Dave H. A. Blank ◽  
Guus A. J. H. M. Rijnders
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Complex Oxide ◽  
Laser Deposition ◽  
Oxygen Stoichiometry ◽  
Oxide Thin Films ◽  
Film Synthesis ◽  
Kinetics Of ◽  
Oxidation Mechanisms

Abstract For thin film synthesis of complex oxides, one of the most important issues has always been how to oxidise the material. For a technique like pulsed laser deposition, a key benefit is the relatively high oxygen background pressure one can operate at, and therefor oxidation should be relatively straightforward. However, understanding the microscopic oxidation mechanisms turns out to be rather difficult. In this perspective, we give a brief overview of the sources of oxidation for complex oxide thin films grown by pulsed laser deposition. While it is clear what these sources are, their role in the kinetics of the formation of the crystal structure and oxygen stoichiometry is not fully understood.

scholarly journals Semiconductor technology: Kinetics of pulsed laser annealing

Nature ◽  
1985 ◽  
Vol 313 (5998) ◽  
pp. 100-100 ◽  
Author(s):  
Ian W. Boyd ◽  
Steven C. Moss
Keyword(s):  
Laser Annealing ◽  
Pulsed Laser ◽  
Semiconductor Technology ◽  
Pulsed Laser Annealing ◽  
Kinetics Of

Reaction Kinetics of Atomic chlorine on Si(100)2×1

1992 ◽  
Vol 280 ◽  
Author(s):  
Kazuhiro Karahashi ◽  
Jiro Matsuo ◽  
Kei Horiuchi
Keyword(s):  
Activation Energy ◽  
Transition State ◽  
Solid Surface ◽  
Surface Reaction ◽  
Thermal Excitation ◽  
Silicon Substrates ◽  
Chlorine Atoms ◽  
Substrate Temperatures ◽  
Kinetics Of ◽  
Atomic Chlorine

ABSTRACTThe interaction of atomic chlorine with Si(100)2×1 surfaces was studied by using chlorine atom beams. The etching reaction of silicon substrates has been observed when chlorine atoms impinged on the chlorinated surface, at substrate temperatures below 600°C. The major desorption product is SiCl2. Studies of the temperature dependence of the reaction showed that the activation energy are 0.08 eV at 0.4 ML and 0.2 eV at 0.8 ML. These extremely low activation energies suggest that the surface reaction is mainly driven by the internal energy of incident atomic chlorine instead of thermal excitation from Si(100) solid surface. Therefore chlorine atoms enter the transition state without equilibrating at the surface prior to the reaction. The reaction strongly depends on the chlorine coverage on the surface. The reaction occurred above 0.3 ML. The etching probability of the surface reached a maximum at 0.4 ML, and decreased with increasing coverage.

Crystallization kinetics of Cu∕a-Si bilayer recording film under thermal and pulsed laser annealing

2004 ◽  
Vol 96 (10) ◽  
pp. 5563-5568 ◽  
Author(s):  
Yung-Chiun Her ◽  
Chun-Lin Wu
Keyword(s):  
Crystallization Kinetics ◽  
Laser Annealing ◽  
Pulsed Laser ◽  
Pulsed Laser Annealing ◽  
Kinetics Of

Free-radical propagation and termination kinetics of the butyl acrylate dimer studied by pulsed laser polymerization techniques

Polymer ◽  
2009 ◽  
Vol 50 (14) ◽  
pp. 3111-3118 ◽  
Author(s):  
Michael Buback ◽  
Thomas Junkers ◽  
Matthias Müller
Keyword(s):  
Free Radical ◽  
Butyl Acrylate ◽  
Pulsed Laser ◽  
Kinetics Of ◽  
Radical Propagation ◽  
Pulsed Laser Polymerization
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