NEW APPROACH FOR DETECTING SLIGHT SHIFT ON PROCESS MEAN IN CHIP RESISTOR PRODUCTION
This article highlights an alternative approach to identify a slight shift of the process mean for resistor production. Commonly, the industries use exponentially weighted moving average (EWMA) or classic I-MR charts for this kind of product. The parametric control chart consists of few underlying assumptions, especially observations that come from a normal distribution. A misleading conclusion was mainly made when non-normal distributed data were analyzed using a parametric control chart. A chip resistor manufacturing company provided the data for the study for future quality monitoring purposes. This study aims to determine a more appropriate analysis method according to the characteristics of the chip resistor data distribution. This article discusses the results of implementing one of the nonparametric methods that are still rarely known. The company’s current I-MR, corrective I-MR, parametric EWMA, and NPEWMA-SR control charts are used and compared in the analysis part. In the comparison, the I-MR control chart cannot detect a slight shift in the process mean. In contrast, the parametric EWMA control chart is not robust for data from a non-normal population. Since the data was not naturally from a normally distributed population, the nonparametric control chart is more appropriate, and the NPEWMA-SR control chart is suggested.