Methods of Enhancing Uniformities of Output Beams from Beam Expanding Unit for Illumination System of Deep-Ultraviolet Lithography

2012 ◽  
Vol 32 (8) ◽  
pp. 0822004
Author(s):  
赵阳 Zhao Yang ◽  
巩岩 Gong Yan
Keyword(s):  
Ultraviolet Lithography ◽  
Illumination System ◽  
Deep Ultraviolet

Tolerance Analysis of Micromirror Array in Deep Ultraviolet Lithography Illumination System

2020 ◽  
Vol 40 (7) ◽  
pp. 0722001
Author(s):  
尹超 Yin Chao ◽  
李艳秋 Li Yanqiu ◽  
闫旭 Yan Xu ◽  
刘克 Liu Ke ◽  
刘丽辉 Liu Lihui
Keyword(s):  
Tolerance Analysis ◽  
Ultraviolet Lithography ◽  
Illumination System ◽  
Deep Ultraviolet ◽  
Micromirror Array

The Application of Silicon Rich Nitride Films for Use as Deep-Ultraviolet Lithography Phase-Shifting Masks

1998 ◽  
Vol 37 (Part 1, No. 2) ◽  
pp. 571-576 ◽  
Author(s):  
Zhong-Tao Jiang ◽  
Tomuo Yamaguchi ◽  
Kentaro Ohshimo ◽  
Mitsuru Aoyama ◽  
Leo Asinovsky
Keyword(s):  
Phase Shifting ◽  
Ultraviolet Lithography ◽  
Deep Ultraviolet

Nanofabrication with deep-ultraviolet lithography and resolution enhancements

1999 ◽  
Vol 17 (6) ◽  
pp. 3310 ◽  
Author(s):  
M. Fritze ◽  
S. Palmateer ◽  
P. Maki ◽  
J. Knecht ◽  
C. K. Chen ◽  
...  
Keyword(s):  
Ultraviolet Lithography ◽  
Deep Ultraviolet
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