Tolerance Analysis of Micromirror Array in Deep Ultraviolet Lithography Illumination System

Acta Optica Sinica ◽

10.3788/aos202040.0722001 ◽

2020 ◽

Vol 40 (7) ◽

pp. 0722001

Author(s):

尹超 Yin Chao ◽

李艳秋 Li Yanqiu ◽

闫旭 Yan Xu ◽

刘克 Liu Ke ◽

刘丽辉 Liu Lihui

Keyword(s):

Tolerance Analysis ◽

Ultraviolet Lithography ◽

Illumination System ◽

Deep Ultraviolet ◽

Micromirror Array

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Methods of Enhancing Uniformities of Output Beams from Beam Expanding Unit for Illumination System of Deep-Ultraviolet Lithography

Acta Optica Sinica ◽

10.3788/aos201232.0822004 ◽

2012 ◽

Vol 32 (8) ◽

pp. 0822004

Author(s):

赵阳 Zhao Yang ◽

巩岩 Gong Yan

Keyword(s):

Ultraviolet Lithography ◽

Illumination System ◽

Deep Ultraviolet

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A multilayer inorganic antireflective system for use in 248 nm deep ultraviolet lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588581 ◽

1996 ◽

Vol 14 (6) ◽

pp. 4229 ◽

Author(s):

R. A. Cirelli

Keyword(s):

Ultraviolet Lithography ◽

Deep Ultraviolet

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The Application of Silicon Rich Nitride Films for Use as Deep-Ultraviolet Lithography Phase-Shifting Masks

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.571 ◽

1998 ◽

Vol 37 (Part 1, No. 2) ◽

pp. 571-576 ◽

Author(s):

Zhong-Tao Jiang ◽

Tomuo Yamaguchi ◽

Kentaro Ohshimo ◽

Mitsuru Aoyama ◽

Leo Asinovsky

Keyword(s):

Phase Shifting ◽

Ultraviolet Lithography ◽

Deep Ultraviolet

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Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588615 ◽

1996 ◽

Vol 14 (6) ◽

pp. 4175 ◽

Author(s):

Anthony Yen

Keyword(s):

Proximity Effects ◽

Behavior Modeling ◽

Ultraviolet Lithography ◽

Deep Ultraviolet

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Applying deep ultraviolet lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585150 ◽

1990 ◽

Vol 8 (6) ◽

pp. 1740 ◽

Author(s):

Mike Tipton

Keyword(s):

Ultraviolet Lithography ◽

Deep Ultraviolet

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Deep-ultraviolet lithography simulator tuning by resist profile matching

10.1117/12.346889 ◽

1999 ◽

Author(s):

Xinhui Niu ◽

Nickhil H. Jakatdar ◽

Costas J. Spanos

Keyword(s):

Ultraviolet Lithography ◽

Profile Matching ◽

Deep Ultraviolet

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Fabrication of a complex-shaped mirror for an extreme ultraviolet lithography illumination system

Optical Engineering ◽

10.1117/1.1591797 ◽

2003 ◽

Vol 42 (9) ◽

pp. 2676 ◽

Author(s):

Hideo Takino

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Illumination System

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Nanofabrication with deep-ultraviolet lithography and resolution enhancements

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.591001 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3310 ◽

Author(s):

M. Fritze ◽

S. Palmateer ◽

P. Maki ◽

J. Knecht ◽

C. K. Chen ◽

...

Keyword(s):

Ultraviolet Lithography ◽

Deep Ultraviolet

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Manufacture of fly-eye mirror in an extreme-ultraviolet lithography illumination system by means of ultraprecision diamond cutting

10.1117/12.472341 ◽

2002 ◽

Author(s):

Yoshinori Hashimoto ◽

Yoshimi Takeuchi ◽

Tomohiko Kawai ◽

Kiyoshi Sawada ◽

Hideo Takino ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Diamond Cutting ◽

Ultraviolet Lithography ◽

Illumination System ◽

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Grouping design method of catadioptric projection objective for deep ultraviolet lithography

Optical Engineering ◽

10.1117/1.oe.56.2.025102 ◽

2017 ◽

Vol 56 (2) ◽

pp. 025102

Author(s):

Zhen Cao ◽

Yanqiu Li ◽

Shanshan Mao

Keyword(s):

Design Method ◽

Ultraviolet Lithography ◽

Deep Ultraviolet

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