Fabrication and Calibration of a Thin Film Heat Flux Sensor
2013 ◽
Vol 718-720
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pp. 1181-1184
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In order to measure heat flux in micro scale space, a thin film heat flux sensor is designed, fabricated and calibrated. Vacuum coating technology is applied to fabricate the sensor with a total thickness of 0.49μm. Silicon dioxide wafer is used as substrate. Cobalt and stibium is deposited on the substrate to form thermopile. Correlation coefficient R is 0.94025. Sensitivity of the heat flux sensor is 0.05062 μV/(W/m2). Time constant of the sensor is 0.66044 seconds. Dynamic test shows that the heat flux sensor responds rapidly to periodic heat flux which is supplied by halogen lamp.
2014 ◽
Vol 960-961
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pp. 304-307
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2020 ◽
Vol 2020
(0)
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pp. J05229
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2002 ◽
Vol 13
(6)
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pp. 932-938
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2010 ◽
Vol 76
(765)
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pp. 859-864
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Keyword(s):
Temperature Coefficient of Thin Film Resistance Temperature Detectors for Improved Heat Flux Sensors
2013 ◽
Vol 378
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pp. 302-307
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Keyword(s):
The One
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