Static and Dynamic Response of a Cu-Ni Thin Film Heat Flux Sensor

2014 ◽  
Vol 960-961 ◽  
pp. 304-307
Author(s):  
Shuo Wu ◽  
Fang Ye ◽  
Hang Guo ◽  
Chong Fang Ma
Keyword(s):  
Thin Film ◽  
Heat Flux ◽  
Polyimide Film ◽  
Heat Flux Sensor ◽  
Coating Technology ◽  
State Tests ◽  
Static And Dynamic Tests ◽  
Film Substrate ◽  
Different Thickness ◽  
Flux Sensor

A Cu-Ni thin film heat flux sensor had been fabricated on a 0.05mm thick polyimide film substrate by vacuum coating technology. The overall dimension of the sensor was 8 mm long and 4 mm wide. A thermopile and a thermocouple were arranged on the substrate to measure both heat flux and surface temperature. The thermopile had 18 thermocouple junctions which formed 9 pairs of differential thermocouples and were covered by two different thickness of thermal resistance layers. This research carried out static and dynamic tests of the thin film heat flux sensor. Seebeck coefficient of thermocouple is 19.3761μV/(°C). Sensitivity of the thermopile is 0.010121μV/(W/m2). Steady-state tests of the thermopile and the thermocouple were taken separately. Time constant of the thermocouple is about 0.26s, which is faster than the thermopile of 1.57s.

Fabrication and Calibration of a Thin Film Heat Flux Sensor

2013 ◽  
Vol 718-720 ◽  
pp. 1181-1184 ◽  
Author(s):  
Jia Xing Liu ◽  
Hang Guo ◽  
Jun Ying Jiang ◽  
Fang Ye ◽  
Chong Fang Ma
Keyword(s):  
Thin Film ◽  
Heat Flux ◽  
Dynamic Test ◽  
Scale Space ◽  
Heat Flux Sensor ◽  
Halogen Lamp ◽  
Total Thickness ◽  
Coating Technology ◽  
Periodic Heat ◽  
Flux Sensor

In order to measure heat flux in micro scale space, a thin film heat flux sensor is designed, fabricated and calibrated. Vacuum coating technology is applied to fabricate the sensor with a total thickness of 0.49μm. Silicon dioxide wafer is used as substrate. Cobalt and stibium is deposited on the substrate to form thermopile. Correlation coefficient R is 0.94025. Sensitivity of the heat flux sensor is 0.05062 μV/(W/m2). Time constant of the sensor is 0.66044 seconds. Dynamic test shows that the heat flux sensor responds rapidly to periodic heat flux which is supplied by halogen lamp.

On self-heating calibration of double layer thin film RTD heat flux sensor

2020 ◽  
Vol 2020 (0) ◽  
pp. J05229
Author(s):  
Shohei SHIMODA ◽  
Osamu NAKABEPPU ◽  
Makoto KAMATA ◽  
Daichi KATANO
Keyword(s):  
Thin Film ◽  
Heat Flux ◽  
Double Layer ◽  
Heat Flux Sensor ◽  
Self Heating ◽  
Layer Thin Film ◽  
Flux Sensor

Thin-Film Heat-Flux Microsensor for Heat-Transfer Measurement in Micro-Heat Exchangers/Microreactors

2012 ◽  
Author(s):  
Houssein Ammar ◽  
David Hamadi ◽  
Bertrand Garnier ◽  
Ahmed Ould El Moctar ◽  
Hassan Peerhossaini ◽  
...  
Keyword(s):  
Thin Film ◽  
Heat Transfer ◽  
Heat Flux ◽  
Heat Exchangers ◽  
Measurement Techniques ◽  
Heat Transfer Analysis ◽  
Heat Flux Sensor ◽  
Transfer Measurement ◽  
Heat Transfer Measurement ◽  
Flux Sensor

Heat-transfer analysis in microfluidic devices is of great importance in applications such as micro-heat exchangers and microreactors. This work reports on improvements in temperature measurement techniques, which can be the source of large errors due to their intrusiveness and the unreliability of conventional thermal sensors. Gold thin films were deposited on a borosilicate substrate to realize a 2D heat flux sensor for heat-transfer measurement along the main flow within microchannels. Two applications are shown, one related to micro-heat exchangers and the other to microreactors. For the micro-heat exchanger, the effect of length scale on heat transfer in a straight microchannel was investigated and the validity of macroscale correlations for convective heat transfer was checked for deionized water flowing in microchannels of heights 12 to 52 μm. For the microreactor, the reaction enthalpy of an acid–base reaction measured using the new heat-flux sensor had only a 5% discrepancy from the standard value, showing the efficiency of the new thin-film device.

Temperature Coefficient of Thin Film Resistance Temperature Detectors for Improved Heat Flux Sensors

2013 ◽  
Vol 378 ◽  
pp. 302-307 ◽  
Author(s):  
B. Azerou ◽  
B. Garnier ◽  
A. Lahmar
Keyword(s):  
Thin Film ◽  
Heat Flux ◽  
Temperature Coefficient ◽  
Flux Measurement ◽  
External Boundary ◽  
Heat Flux Sensor ◽  
Film Resistance ◽  
Heat Flux Sensors ◽  
The One ◽  
Flux Sensor

The measurement of thermal properties or internal or external boundary conditions requires temperature and heat flux data. Both information can be provided by heat flux sensors. The one consisting in measuring temperature at various locations within the wall and using inverse method to estimate wall temperature and heat flux is among those providing the lowest measurement bias for transient heat flux measurement. However, this very accurate sensor requires time consuming technical work for microthermocouples implementation and due to the welding, one cannot locate precisely the temperature measurement. The idea developed in this work is to replace the wire microthermocouples by thin film resistance temperature detectors deposited on polymer substrate in order to ease the fabrication and to increase the accuracy of heat flux sensor. As the deposited sensors are RTDs, a preliminary study is performed showing the effect of the metal as well as the processing conditions on the electrical resistivity and temperature coefficient of copper and aluminum thin film

High-Temperature Heat Flux Sensor Based on Tungsten–Rhenium Thin-Film Thermocouple

2020 ◽  
Vol 20 (18) ◽  
pp. 10444-10452
Author(s):  
Xiaoli Fu ◽  
Qiyu Lin ◽  
Yongqing Peng ◽  
Jianhua Liu ◽  
Xiaofei Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Heat Flux ◽  
High Temperature ◽  
Heat Flux Sensor ◽  
Thin Film Thermocouple ◽  
Temperature Heat ◽  
Flux Sensor
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