A Hydride Generation-Nanosilver Surface Plasmon Resonance Absorption Spectral Method for the Determination of Trace Se(IV)

2013 ◽  
Vol 749 ◽  
pp. 491-494
Author(s):  
Ai Hui Liang ◽  
Qing Ye Liu ◽  
Gui Qing Wen ◽  
Ting Sheng Li ◽  
Zhi Liang Jiang
Keyword(s):  
Surface Plasmon Resonance ◽  
Detection Limit ◽  
Surface Plasmon ◽  
Plasmon Resonance ◽  
Water Samples ◽  
Hydride Generation ◽  
Resonance Absorption ◽  
Surface Plasmon Resonance Absorption ◽  
Hcl Solution

In HCl solution, the Se (IV) was reduced to SeH2 by NaBH4, and absorbed by solution of ethanol-AgNO3. The Ag+ was reduced to nanosilver that exhibited surface plasmon resonance absorption (SPR) peaks at 292 nm and 420 nm. Under the selected conditions, the value at 292 nm was linear to the concentration of Se (IV) in the range of 0.08-2.0 μg/mL, a detection limit of 0.04 μg/mL. The proposed method was applied to detect Se (IV) in water samples, with satisfactory results.

Part per trillion determination of atrazine in natural water samples by a surface plasmon resonance immunosensor

2007 ◽  
Vol 388 (1) ◽  
pp. 207-214 ◽  
Author(s):  
Marinella Farré ◽  
Elena Martínez ◽  
Javier Ramón ◽  
Alicia Navarro ◽  
Jelena Radjenovic ◽  
...  
Keyword(s):  
Surface Plasmon Resonance ◽  
Surface Plasmon ◽  
Plasmon Resonance ◽  
Natural Water ◽  
Water Samples ◽  
Natural Water Samples

SURFACE PLASMON RESONANCE ABSORPTION OF ALBUMIN/WATER ON Ni THIN FILM DEPOSITED ON Si AT 230°C

2008 ◽  
Vol 20 (06) ◽  
pp. 393-400
Author(s):  
Y.-L. Yang ◽  
T.-F. Young ◽  
W.-C. Kuo ◽  
S.-H. Fang ◽  
Y.-K. Chao
Keyword(s):  
Thin Film ◽  
Surface Plasmon Resonance ◽  
Surface Plasmon ◽  
Plasmon Resonance ◽  
Grazing Angle ◽  
Rf Sputtering ◽  
Resonance Absorption ◽  
High Activation ◽  
Experimental Conditions ◽  
Surface Plasmon Resonance Absorption

In this work we have studied the surface plasmon resonance (SPR) absorption of Albumin on NiSi nanoparticle thin film deposited on Si. The thin films were deposited by means of RF sputtering on Si at various temperatures and times for different thicknesses, and characterized by grazing angle XRD and SEM. From these experimental conditions, we only observed a formation of NiSi nanoparticles deposited on Si at 230°C for 15 min to 30 min. The silicon atoms seem to emerge out of the surface and react with Nickel's. Due to the high activation energy, this mechanism would not take place at lower temperatures, such as RT and 122°C. Mixture of Albumin and water with varied concentrations has been prepared for the measurement of SPR absorption on the NiSi nanoparticle thin film. We found the spectra of SPR absorption of Albumin on the sample, which NiSi nanoparticle thin film was deposited on Si at 230°C, exhibits a specific shift due to the formation of NiSi nanoparticle.

Thermal Stability of Surface Plasmon Resonance Absorption in а-С:Н〈Ag + TiО2〉 Nanocomposite Films

2018 ◽  
Vol 125 (6) ◽  
pp. 864-869
Author(s):  
O. Yu. Prikhod’ko ◽  
S. L. Mikhailova ◽  
E. S. Mukhametkarimov ◽  
K. Dautkhan ◽  
S. Ya. Maksimova ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Surface Plasmon Resonance ◽  
Surface Plasmon ◽  
Plasmon Resonance ◽  
Resonance Absorption ◽  
Nanocomposite Films ◽  
Surface Plasmon Resonance Absorption ◽  
Thermal Stability Of
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