Ferroelectric and Dielectric Characteristics of Bi3.25La0.75Ti3O12 Thin Films Prepared by the Polymeric Precursor Method

2006 ◽  
Vol 514-516 ◽  
pp. 212-215 ◽  
Author(s):  
A.Z. Simões ◽  
M.A. Ramírez ◽  
B.D. Stojanović ◽  
Z. Marinković ◽  
Elson Longo ◽  
...  

The ferroelectric properties and leakage current mechanisms of preferred oriented Bi3.25La0.75Ti3O12 (BLT) thin films deposited on La0.5Sr0.5CoO3 (LSCO) by the polymeric precursor method were investigated. Atomic force microscopy indicates that the deposited films exhibit a dense microstructure with a rather smooth surface morphology. The improved ferroelectric and leakage current characteristics can be ascribed to the plate-like grains of the BLT films.

2001 ◽  
Vol 49 (6) ◽  
pp. 365-370 ◽  
Author(s):  
M.S.J Nunes ◽  
E.R Leite ◽  
F.M Pontes ◽  
N.M Duboc ◽  
E Longo ◽  
...  

2004 ◽  
Vol 96 (4) ◽  
pp. 2181-2185 ◽  
Author(s):  
S. Ezhilvalavan ◽  
Victor Samper ◽  
Toh Wei Seng ◽  
Xue Junmin ◽  
John Wang

2001 ◽  
Vol 688 ◽  
Author(s):  
J. Rodríguez Contreras ◽  
J. Schubert ◽  
U. Poppe ◽  
O. Trithaveesak ◽  
K. Szot ◽  
...  

AbstractWe have prepared single crystalline epitaxial PbZr0.52Ti0.48O3 (PZT) and BaTiO3 (BTO) thin films on single crystalline epitaxial SrRuO3 (SRO) thin films grown on SrTiO3 (100) (STO) substrates. PZT and SRO thin films were grown using high-pressure on-axis sputtering and BTO using pulsed laser deposition (PLD). The film thickness ranged between 12 to 165 nm. Their excellent structural properties, surface smoothness and interface sharpness were demonstrated by X-Ray Diffraction measurements (XRD), High Resolution Transmission Electron Microscopy (HRTEM) and Atomic Force Microscopy (AFM). Rutherford Backscattering Spectrometry and Channeling measurements (RBS/C) were used to analyze stoichiometry and crystalline quality. Ferroelectric hysteresis loops were obtained for all films of a thickness down to 12 nm showing a decrease in the remanent polarization Pr and an increase in the coercive field Ec towards thinner film thicknesses. Furthermore we have prepared tunneling junctions with a PZT or BTO barrier thickness of 3-6 nm. Reproducible bi-stable I-V-curves and bias dependence of the conductance were obtained suggesting an influence of the ferroelectric properties of the barrier material on the tunnel current.


2001 ◽  
Vol 189-191 ◽  
pp. 155-160 ◽  
Author(s):  
A.H.M. González ◽  
A.Z. Simões ◽  
José Arana Varela ◽  
M.A. Zaghete ◽  
Elson Longo

2000 ◽  
Vol 87 (11) ◽  
pp. 8031-8034 ◽  
Author(s):  
James A. Christman ◽  
Seung-Hyun Kim ◽  
Hiroshi Maiwa ◽  
Jon-Paul Maria ◽  
Brian J. Rodriguez ◽  
...  

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