Si1-XGeX Selective Etchant for Gate-All-Around Transistors
Keyword(s):
3 formulated etchants were prepared and their etch rates were measured using blanket wafers in order to confirm that the etching reactions on Si1-XGeX and Si are controllable. Si1-XGeX selective etching with those formulations was also verified using the wafers which had Si1-XGeX and Si multi-stacked structures. Cross-sectional transmission electron microscope (TEM) images suggested that the formulations were usable for Si1-XGeX selective etching processes.
1997 ◽
Vol 36
(Part 1, No. 4A)
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pp. 2298-2302
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1997 ◽
Vol 36
(Part 1, No. 5A)
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pp. 2561-2564
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1990 ◽
Vol 31
(7)
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pp. 602-607
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1998 ◽
Vol 37
(Part 2, No. 6B)
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pp. L752-L754
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1989 ◽
Vol 28
(Part 2, No. 8)
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pp. L1398-L1401
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1996 ◽
Vol 54
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pp. 700-701