IGNITION AND PROPERTIES OF RF CAPACITIVE DISCHARGE IN ACETYLENE

In the present work, we measured breakdown and extinction curves of radio-frequency discharge in acetylene as well as dependences of active current, power and gas pressure on the discharge burning time, and also optical emission spectra. It was found that in the region of low acetylene pressures (to the left of the minimum of the breakdown curve), the discharge can cover only a part of the electrode surface. Immediately after the ignition of the discharge, due to the intense deposition of the polymer film and the formation of dust particles in the plasma volume, the gas pressure decreases sharply (by the factor of 2-5), while the active current and power increase and then reach saturation. In the discharge with intense polymerization, the lines of atomic and molecular hydrogen dominate in the emission spectrum of the discharge. The film deposited on the surface of the electrodes and the tube walls, as well as the dust particles formed, are amorphous, the maximum peak of XRD spectrum is observed at 2θ = 18°, and the light absorption by the deposited films is highest at 440 nm wavelength.

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Effect of Ion Bombardment on the Structure and Properties of PECVD SiO2

MRS Proceedings ◽

10.1557/proc-363-107 ◽

1994 ◽

Vol 363 ◽

Cited By ~ 3

Author(s):

Jung H. Lee ◽

Dong S. Kim ◽

Young H. Lee

Keyword(s):

Plasma Reactor ◽

Substrate Surface ◽

Emission Spectra ◽

Optical Emission ◽

Ion Bombardment ◽

Ion Energy ◽

On Line ◽

Spectrometer Data ◽

Optical Emission Spectra ◽

Deposited Films

AbstractSiO2 films were deposited on silicon wafers at 25°C by plasma enhanced decomposition of tetraethoxysilane (TEOS) in a mixture of argon and oxygen. The deposition was performed in a rf-powered (13.56 MIHz) asymmetric plasma reactor. The effect of ion bombardment was evaluated by varying the ion energy flux (IEF) at the substrate surface from 0.93 to 9.94 W/cm2. On-line optical emission spectra (OES) revealed CO, CH, and H peaks whose absorption intensities increased with increasing applied power. On-line mass spectrometer data showed that the peak intensities of OC2H5, SiOH (m/e=45), and HSiOH (m/e=46) fragments decreased with increasing applied power indicating the decomposition of these species. FTIR spectra of the deposited films showed that the concentrations of Si-OH and trapped CO gases in the film decreased with increasing IEF. Also, the FTIR results and the refractive index measurements indicated that the film density increased as a function of IEF. The stoichiometry of the film did not change when IEF was below 2, but for IEF greater than 4.91 W/cm2, the film became Si-rich.

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Optical spectroscopic study of the radio-frequency oxygen thermal plasma evaporated YBa2Cu3O7−x

Journal of Materials Research ◽

10.1557/jmr.1993.0709 ◽

1993 ◽

Vol 8 (4) ◽

pp. 709-712 ◽

Cited By ~ 4

Author(s):

Shigenori Yuhya ◽

Jiro Tsujino ◽

Noriyuki Tatsumi ◽

Yuh Shiohara

Keyword(s):

Thermal Plasma ◽

Stoichiometric Composition ◽

Emission Spectra ◽

Optical Emission ◽

Lower Plasma ◽

Rf Thermal Plasma ◽

Emitting Species ◽

Optical Emission Spectra ◽

Deposited Film ◽

Deposited Films

Optical emission spectroscopy of the rf thermal plasma evaporated YBa2Cu3O7−x has been investigated. The deposited films with the nearly stoichiometric composition could be obtained by using Y-rich powder. From the optical emission spectra, O, Y, Y+, Ba, Ba+, Cu, and YO as the emitting species were observed. The excitation temperature was lower for Y+ than for the other dissociated elements. The relative intensity for YO of a suboxide became larger with a lower plasma torch. It is thought that the deposited film that is poor in Y results from YO sticking to the substrate rather than Y or Y+.

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Optical Emission Spectra of Oxygen Plasma Produced by Radio-Frequency Plasma

Applied Science and Convergence Technology ◽

10.5757/jkvs.2009.18.2.102 ◽

2009 ◽

Vol 18 (2) ◽

pp. 102-107

Author(s):

Do-Yeob Kim ◽

Min-Su Kim ◽

Tae-Hoon Kim ◽

Ghun-Sik Kim ◽

Hyun-Young Choi ◽

...

Keyword(s):

Radio Frequency ◽

Oxygen Plasma ◽

Emission Spectra ◽

Optical Emission ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Optical Emission Spectra

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REFORMING OF ETHANOL IN PLASMA-CATALYTIC SYSTEM WITH DC AND AC ROTATING GLIDING DISCHARGE

10.46813/2021-131-117 ◽

2021 ◽

pp. 117-121

Author(s):

O.A. Nedybaliuk ◽

T.A. Tereshchenko ◽

I.I. Fedirchyk ◽

P.V. Tyshchuk ◽

V.P. Demchina

Keyword(s):

Synthesis Gas ◽

Emission Spectra ◽

Optical Emission ◽

Reaction Chamber ◽

Catalytic Reforming ◽

Instantaneous Power ◽

Wide Aperture ◽

Ethanol Reforming ◽

Gliding Discharge ◽

Optical Emission Spectra

The article presents the results of the investigation of the reforming of ethanol into synthesis gas using a plasmacatalytic system with either AC or DC wide-aperture rotating gliding discharge. Current and voltage oscillograms of the wide-aperture rotating gliding discharge were measured. The time-dependence of the instantaneous power of the discharge in the air was built. The photographs of the discharge in the airflow and discharge during the ethanol reforming were compared. The optical emission spectra of the plasmas of the torches of AC and DC wide-aperture rotating gliding discharges were studied. The rotational and vibrational temperatures of the plasma torch in the reaction chamber were determined. The results of the gas-chromatography of the synthesis gas produced during the plasm-catalytic reforming of ethanol using either AC or DC rotating gliding discharge are presented.

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