INVESTIGATION OF THE CARRIER LIFETIME IN NEUTRON-DOPED SILICON DEPENDING ON THE CONCENTRATION OF THE INITIAL BORON
2020 ◽
Vol 4
(4)
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pp. 57-61
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The dependence of the lifetime of charge carriers ()in monocrystalline silicon on the concentration of light copper and post-diffusion cooling is discussed. The results obtained are explained by the redistribution of non-basic carriers at the adhesion level. In the compensated “p-Si” and the control “p-Si”, the relaxation process occurs in different wasy 98s for “p-Si”, and 5s for “p-Si”.At the same time ,with the growth of te initial concentration of charge carriers (in this case boron-B ) in the compensated silicon, an increase (with equal values ) is observed, which is due to a different degree of micro –uniformity in conductivity in the studied samples.
2017 ◽
Vol 114
(29)
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pp. 7519-7524
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1973 ◽
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2012 ◽
Vol 258
(22)
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pp. 8889-8894
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1996 ◽
Vol 11
(11)
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pp. 1713-1717
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