Modeling and simulation of acid generation in anion-bound chemically amplified resists used for extreme ultraviolet lithography

2015 ◽  
Vol 54 (3) ◽  
pp. 036506 ◽  
Author(s):  
Yoshitaka Komuro ◽  
Daisuke Kawana ◽  
Taku Hirayama ◽  
Katsumi Ohomori ◽  
Takahiro Kozawa
Keyword(s):  
Modeling And Simulation ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography

2014 ◽  
Vol 53 (11) ◽  
pp. 116503 ◽  
Author(s):  
Yoshitaka Komuro ◽  
Hiroki Yamamoto ◽  
Kazuo Kobayashi ◽  
Yoshiyuki Utsumi ◽  
Katsumi Ohomori ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Generation Mechanism ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Photoacid generator–polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography

2018 ◽  
Vol 6 (27) ◽  
pp. 7267-7273 ◽  
Author(s):  
Roberto Fallica ◽  
Yasin Ekinci
Keyword(s):  
Quantum Yield ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Polymer Backbone ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator ◽  
Polymer Interaction

The rate of photoacid generation is measured experimentally and it is demonstrated to depend on the interaction between polymer backbone and photoacid generator. The clearing volume per absorbed photon and per generated photoacid is also calculated and discussed in view of lithographic resolution and roughness.

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