Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography

2015 ◽  
Vol 54 (6S1) ◽  
pp. 06FD01
Author(s):  
Hsuan-Ping Lee ◽  
Sheng-Yung Chen ◽  
Chun-Hung Liu ◽  
Qi Ding ◽  
Yu-Tian Shen ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Optical System ◽  
Numerical Optimization ◽  
Optimization Method ◽  
Emission Source ◽  
Direct Write ◽  
Electron Optical System

A multiple-electron-beam exposure system for high-throughput, direct-write submicrometer lithography

1981 ◽  
Vol 28 (11) ◽  
pp. 1422-1428 ◽  
Author(s):  
I. Brodie ◽  
E.R. Westerberg ◽  
D.R. Cone ◽  
J.J. Muray ◽  
N. Williams ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Direct Write ◽  
Exposure System

High-throughput NGL electron-beam direct-write lithography system

2000 ◽  
Author(s):  
N. William Parker ◽  
Alan D. Brodie ◽  
John H. McCoy
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Direct Write ◽  
Lithography System

Simulation of the electron-optical system of the MIS-I electron-beam multicharged ion

2003 ◽  
Author(s):  
V. G. Abdul'manov ◽  
P. D. Voblyi ◽  
A. V. Utkin ◽  
V. P. Tomilov ◽  
Yu. N. Yudin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Optical System ◽  
Electron Optical System

Simulation of electron beam formation and transport in a gas-filled electron-optical system with a plasma emitter

2016 ◽  
Vol 42 (7) ◽  
pp. 713-717 ◽  
Author(s):  
A. A. Grishkov ◽  
S. Yu. Kornilov ◽  
N. G. Rempe ◽  
S. V. Shidlovskiy ◽  
V. A. Shklyaev
Keyword(s):  
Electron Beam ◽  
Optical System ◽  
Electron Optical System ◽  
Plasma Emitter ◽  
Beam Formation

scholarly journals NUMERICAL SIMULATION OF MULTIBEAM SYSTEMS BY EL&ION CODE

2020 ◽  
pp. 92-93
Author(s):  
P.A. Martynenko
Keyword(s):  
Numerical Simulation ◽  
Electron Beam ◽  
Numerical Analysis ◽  
Optical System ◽  
Ion Beam ◽  
High Density ◽  
Second Law ◽  
Electron Optical System ◽  
Reactive Gases ◽  
A Current

Based on the tube method, taking into account the three second law for the current in each tube, the program EL&ION for preliminary rapid numerical analysis of the electron-optical system was developed, using which the system was developed for generating an ion beam of reactive gases with an energy of up to 50 keV and a current of 10...20 mA in the presence of high-density electron beam.

Electron-optical system of a small-scale electron beam ion source

2004 ◽  
Author(s):  
V. G. Abdul'manov ◽  
P. D. Voblyi ◽  
P. V. Nevskii
Keyword(s):  
Electron Beam ◽  
Optical System ◽  
Ion Source ◽  
Small Scale ◽  
Electron Optical System

Short beam-path electron optical system for high-throughput submicron lithography

1985 ◽  
Vol 3 (1-4) ◽  
pp. 53-60 ◽  
Author(s):  
Hirofumi Morita ◽  
Teruo Hosokawa ◽  
Minpei Fujinami
Keyword(s):  
High Throughput ◽  
Optical System ◽  
Electron Optical System ◽  
Beam Path ◽  
Short Beam
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