Oxygen atomic density measured with a self-absorption calibrated vacuum ultraviolet absorption spectroscopy and its effect on spore etching in N2/O2surface-wave plasma

2015 ◽  
Vol 54 (7) ◽  
pp. 070308 ◽  
Author(s):  
Xiaoli Yang ◽  
Xijiang Chang ◽  
Reitou Tei ◽  
Koichi Sasaki ◽  
Masaaki Nagatsu
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