Resist image quality control via acid diffusion constant and/or photodecomposable quencher concentration in the fabrication of 11 nm half-pitch line-and-space patterns using extreme-ultraviolet lithography

2018 ◽  
Vol 57 (5) ◽  
pp. 056501 ◽  
Author(s):  
Takahiro Kozawa ◽  
Julius Joseph Santillan ◽  
Toshiro Itani
Keyword(s):  
Quality Control ◽  
Image Quality ◽  
Extreme Ultraviolet ◽  
Diffusion Constant ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Diffusion ◽  
Image Quality Control ◽  
Quencher Concentration

Novel Anionic Photoacid Generators (PAGs) and Photoresists for sub 50 nm Patterning by EUVL and EBL

2006 ◽  
Vol 961 ◽  
Author(s):  
Mingxing Wang ◽  
Cheng-Tsung Lee ◽  
Clifford L Henderson ◽  
Wang Yueh ◽  
Jeanette M Roberts ◽  
...  
Keyword(s):  
Main Chain ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Polymer Main Chain ◽  
Acid Diffusion ◽  
Photoacid Generators ◽  
20 Nm ◽  
Line Space

ABSTRACTA new series of anionic photoacid generators (PAGs), and corresponding polymers were prepared. The thermostability of PAG bound polymers was superior to PAG blend polymers. PAG incorporated into the polymer main chain may improve acid diffusion compared with the PAG blend polymers, which was demonstrated by Extreme Ultraviolet lithography (EUVL) results: the fluorine PAG bound polymer resist gave 45 nm (1:1), 35 nm (1:2), 30 nm (1:3) and 20 nm (1:4) Line/Space as well as 50 nm (1:1) elbow patterned, showed better resolution than the blend sample.

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity
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