Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography
2014 ◽
Vol 54
(1)
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pp. 016502
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2014 ◽
Vol 53
(11)
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pp. 116504
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2011 ◽
Vol 50
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pp. 036504
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2012 ◽
Vol 51
(8R)
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pp. 086504
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2012 ◽
Vol 51
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pp. 086504
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2014 ◽
Vol 53
(8)
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pp. 084002
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2017 ◽
Vol 17
(11)
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pp. 8338-8343
Keyword(s):
2015 ◽
Vol 28
(5)
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pp. 669-675
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2017 ◽
Vol 30
(2)
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pp. 197-203
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