The growth and characterization of multi-layer 1.3 μm InAs - GaAs quantum dot lasers is reported. It is demonstrated that the growth of the GaAs spacer layer, placed between the InAs quantum dot layers, must be carefully optimized to prevent defect formation. With optimized growth very low room temperature threshold current density (J th ) devices are obtained. Typical cw values are 32.5 and 17 A cm-2 for as-grown and HR coated facet devices, respectively. Operation above 100°C is possible. Mechanisms contributing to the temperature sensitivity of J th above room temperature are discussed. By combining the optimized growth with p-type modulation doping of the QDs both low J th and high temperature stability of J th are achieved at room temperature.