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Impact of Trap Behavior in High-k/Metal Gate p-MOSFET with Incorporated Fluorine on Low-Frequency Noise Characteristics
Mapping Intimacies
◽
10.7567/ssdm.2014.ps-3-4
◽
2014
◽
Author(s):
T.–H. Kao
◽
S.–L. Wu
◽
C.–Y. Wu
◽
Y.–K. Fang
◽
P.–C. Huang
◽
...
Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
Metal Gate
◽
Noise Characteristics
◽
High K
Download Full-text
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Impact of Aluminum Ion Implantation on the Low Frequency Noise Characteristics of Hf-Based High-\(k\) /Metal Gate pMOSFETs
IEEE Electron Device Letters
◽
10.1109/led.2014.2336866
◽
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◽
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◽
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Ion Implantation
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Low Frequency
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Frequency Noise
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Low Frequency Noise
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Metal Gate
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Aluminum Ion
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Noise Characteristics
◽
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Low-Frequency Noise Characteristics for Various ${\rm ZrO}_{2}$-Added ${\rm HfO}_{2}$-Based 28-nm High-$k$/Metal-Gate nMOSFETs
IEEE Electron Device Letters
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◽
2013
◽
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Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
Metal Gate
◽
Noise Characteristics
◽
High K
◽
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Investigation of low-frequency noise of 28-nm technology process of high-k/metal gate p-MOSFETs with fluorine incorporation
Solid-State Electronics
◽
10.1016/j.sse.2015.09.013
◽
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◽
Vol 115
◽
pp. 7-11
Author(s):
Tsung-Hsien Kao
◽
Shoou-Jinn Chang
◽
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◽
Po-Chin Huang
◽
Bo-Chin Wang
◽
...
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Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
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Metal Gate
◽
High K
◽
Technology Process
◽
28 Nm
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Improving Low-Frequency Noise in 14-nm FinFET by Optimized High-k/Metal Gate Thermal Processing
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10.1109/led.2021.3091488
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2021
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pp. 1-1
Author(s):
Hao Zhu
◽
Bin Ye
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Chengkang Tang
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◽
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Keyword(s):
Thermal Processing
◽
Low Frequency
◽
Frequency Noise
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Low Frequency Noise
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Metal Gate
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High K
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Low-Frequency Noise Investigation and Noise Variability Analysis in High- $k$/Metal Gate 32-nm CMOS Transistors
IEEE Transactions on Electron Devices
◽
10.1109/ted.2011.2141139
◽
2011
◽
Vol 58
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◽
pp. 2310-2316
◽
Cited By ~ 32
Author(s):
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◽
S. Haendler
◽
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Gregory Bidal
◽
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Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
Metal Gate
◽
Variability Analysis
◽
Cmos Transistors
◽
High K
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Low-Frequency Noise Behavior at Low Temperature (80K–300K) of Silicon Passivated Ge pMOSFETs with High-K Metal Gate Stack
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◽
2007
◽
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Author(s):
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◽
B. Cretu
◽
J.-M. Routoure
◽
R. Carin
◽
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◽
...
Keyword(s):
Low Temperature
◽
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
Metal Gate
◽
Gate Stack
◽
High K
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Low-Frequency-Noise-Based Oxide Trap Profiling in Replacement High-k/Metal-Gate Pmosfets
ECS Meeting Abstracts
◽
10.1149/ma2013-02/33/2246
◽
2013
◽
Keyword(s):
Low Frequency
◽
Frequency Noise
◽
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Metal Gate
◽
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Oxide Trap
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Low frequency noise variability in high-k/metal gate stack 28nm bulk and FD-SOI CMOS transistors
2011 International Electron Devices Meeting
◽
10.1109/iedm.2011.6131581
◽
2011
◽
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◽
S. Haendler
◽
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◽
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N. Planes
◽
...
Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
Metal Gate
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Gate Stack
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Cmos Transistors
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Low-Frequency-Noise-Based Oxide Trap Profiling in Replacement High-k/Metal-Gate pMOSFETs
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◽
10.1149/05809.0281ecst
◽
2013
◽
Vol 58
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◽
pp. 281-292
◽
Cited By ~ 2
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◽
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◽
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Keyword(s):
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Frequency Noise
◽
Low Frequency Noise
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Metal Gate
◽
High K
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Investigation of Low-Frequency Noise in High-k First/Metal Gate Last HfO2 and ZrO2 nMOSFETs
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2014
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◽
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Y.Y. Lu
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Keyword(s):
Low Frequency
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Frequency Noise
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Low Frequency Noise
◽
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High K
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