Alpha spectrometric characterization of thin 233U sources for 229(m)Th production

Four different techniques were applied for the production of 233U alpha recoil ion sources, providing 229Th ions. They were compared with respect to a minimum energy spread of the 229Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. A direct validation for the estimated recoil ion rate was obtained by collecting 228Th recoil ions from 232U recoil ion sources prepared by self-adsorption and Molecular Plating. The chelation and the self-adsorption based approaches appear most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.

Monte Carlo track chemistry simulations of the radiolysis of water induced by the recoil ions of the 10B(n,α)7Li nuclear reaction. 1. Calculation of the yields of primary species up to 350 °C

Monte Carlo calculations were used to simulate the radiolysis of water by 10B(n,α)7Li recoil ions.