2007 International Workshop on Junction Technology
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Published By IEEE

1424411033, 1424411041
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The study of plasma doping process for ultra shallow junctions

2007 ◽  
Author(s):  
S.W. Lee ◽  
J.Y. Jeong ◽  
C.S. Park ◽  
J.H. Kim ◽  
J.Y. Ji ◽  
...  
Keyword(s):  
Plasma Doping ◽  
Shallow Junctions ◽  
Ultra Shallow Junctions

Improving Junction Uniformity and Quality with Optimized Diffusion-less Annealing

2007 ◽  
Author(s):  
John Borland ◽  
Fumio Ootsuka ◽  
Takayuki Aoyama ◽  
Takashi Onizawa ◽  
Andrzej Buczkowski

Formation of High Resistivity Phases of Nickel Silicide at Small Diffusion Region

2007 ◽  
Author(s):  
Ryuji Tomita ◽  
Hiroshi Kimura ◽  
Makoto Yasuda ◽  
Tomowo Nakayama ◽  
Kazutaka Maeda ◽  
...  
Keyword(s):  
Nickel Silicide ◽  
High Resistivity ◽  
Diffusion Region ◽  
Small Diffusion

Development of Nissin new boron cluster ion implanter

2007 ◽  
Author(s):  
Nariaki Hamamoto ◽  
Sei Umisedo ◽  
Yuji Koga ◽  
Takao Matsumoto ◽  
Tsutomu Nagayama ◽  
...  
Keyword(s):  
Boron Cluster ◽  
Cluster Ion

Requirements of the Low Energy Boron Halo Implantation for the Next Generation of LOP/LSTP Devices

2007 ◽  
Author(s):  
Genshu Fuse ◽  
Makoto Sano ◽  
Masazumi Koike ◽  
Masaki Ito ◽  
Fumiaki Sato ◽  
...  
Keyword(s):  
Low Energy ◽  
Next Generation
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