2018 22nd International Conference on Ion Implantation Technology (IIT)
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95
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Published By IEEE

9781538668283, 9781538668290
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

ION-X Dopant Gas Delivery System Performance Characterization at Axcelis

2018 ◽  
Author(s):  
J. Arno ◽  
O. K. Farha ◽  
W. Morris ◽  
P. W. Siu ◽  
G. M Tom ◽  
...  
Keyword(s):  
Delivery System ◽  
System Performance ◽  
Performance Characterization

Conformal Doping with High Dopant Concentration for n+/p and p+/n Si junctions in 3D Devices Using Sol-Gel Coating and Flash Lamp Annealing

2018 ◽  
Author(s):  
Kazuhiko Fuse ◽  
Hideaki Tanimura ◽  
Takayuki Aoyama ◽  
Shinichi Kato ◽  
Yoshihide Nozaki ◽  
...  
Keyword(s):  
Dopant Concentration ◽  
Sol Gel ◽  
Flash Lamp ◽  
High Dopant Concentration

The Defect Formation Mechanism Associated with Low Dose Implants into Si Fin Structures

2018 ◽  
Author(s):  
Kevin Jones ◽  
Emily Turner ◽  
Jae Young Lee ◽  
Hans van Meer ◽  
Naushad Variam ◽  
...  
Keyword(s):  
Formation Mechanism ◽  
Low Dose ◽  
Defect Formation

Boron Deposition Control for p-type Plasma Doping

2018 ◽  
Author(s):  
Vikram Bhosle ◽  
Nicholas Bateman ◽  
Deven Raj ◽  
Tim Miller
Keyword(s):  
Plasma Doping ◽  
P Type ◽  
Deposition Control

The Effects of Preheating in Millisecond Anneals on Dopant Activation in Silicon

2018 ◽  
Author(s):  
Paul Timans ◽  
Christian Pfahler ◽  
Markus Hagedorn ◽  
Alexandr Cosceev ◽  
Manuela Zwissler
Keyword(s):  
Dopant Activation

Analysis of Very High Energy Implantation Profiles at Channeling and Non-Channeling Conditions

2018 ◽  
Author(s):  
Serguei I. Kondratenko ◽  
Leonard M. Rubin ◽  
Eric A. G. Webster
Keyword(s):  
High Energy ◽  
Very High Energy ◽  
Very High

Impact of Carbon on the Deactivation Behaviors of Boron and Phosphorus in Preamorphized Silicon

2018 ◽  
Author(s):  
Ruey-Dar Chang ◽  
Hsueh-Chun Liao ◽  
Jui-Chang Lin ◽  
Jung-Ruey Tsai

Effects of Pre-amorphization Thickness and Carbon Implantation on NiPt/Si Silicidation Process

2018 ◽  
Author(s):  
Laurent Lachal ◽  
Fabrice Nemouchi ◽  
Frederic Mazen ◽  
Philippe Rodriguez ◽  
Magali Gregoire ◽  
...  
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