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2018 22nd International Conference on Ion Implantation Technology (IIT)
Latest Publications
TOTAL DOCUMENTS
95
(FIVE YEARS 0)
H-INDEX
2
(FIVE YEARS 0)
Published By IEEE
9781538668283, 9781538668290
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Conformal Doping with High Dopant Concentration for n+/p and p+/n Si junctions in 3D Devices Using Sol-Gel Coating and Flash Lamp Annealing
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807947
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2018
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Author(s):
Kazuhiko Fuse
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Hideaki Tanimura
◽
Takayuki Aoyama
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Shinichi Kato
◽
Yoshihide Nozaki
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...
Keyword(s):
Dopant Concentration
◽
Sol Gel
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Flash Lamp
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High Dopant Concentration
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Table of contents
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807938
◽
2018
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Download Full-text
The Defect Formation Mechanism Associated with Low Dose Implants into Si Fin Structures
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807979
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2018
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Author(s):
Kevin Jones
◽
Emily Turner
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Jae Young Lee
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Hans van Meer
◽
Naushad Variam
◽
...
Keyword(s):
Formation Mechanism
◽
Low Dose
◽
Defect Formation
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Boron Deposition Control for p-type Plasma Doping
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807913
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2018
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Author(s):
Vikram Bhosle
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Nicholas Bateman
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Deven Raj
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Tim Miller
Keyword(s):
Plasma Doping
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P Type
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Deposition Control
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The Effects of Preheating in Millisecond Anneals on Dopant Activation in Silicon
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807969
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2018
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Author(s):
Paul Timans
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Christian Pfahler
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Markus Hagedorn
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Alexandr Cosceev
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Manuela Zwissler
Keyword(s):
Dopant Activation
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Analysis of Very High Energy Implantation Profiles at Channeling and Non-Channeling Conditions
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807946
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2018
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Cited By ~ 1
Author(s):
Serguei I. Kondratenko
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Leonard M. Rubin
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Eric A. G. Webster
Keyword(s):
High Energy
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Very High Energy
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Very High
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Enriched 11Boron Trifluoride and Hydrogen Mixture for Performance Improvement on Applied Materials E-500 Implanter
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807971
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2018
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Author(s):
Barry Chambers
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Francisco E. Cruz
Keyword(s):
Performance Improvement
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Hydrogen Mixture
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Impact of Carbon on the Deactivation Behaviors of Boron and Phosphorus in Preamorphized Silicon
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807894
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2018
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Author(s):
Ruey-Dar Chang
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Hsueh-Chun Liao
◽
Jui-Chang Lin
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Jung-Ruey Tsai
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ION-X Dopant Gas Delivery System Performance Characterization at Axcelis
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807983
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2018
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Author(s):
J. Arno
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O. K. Farha
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W. Morris
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P. W. Siu
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G. M Tom
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...
Keyword(s):
Delivery System
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System Performance
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Performance Characterization
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Effects of Pre-amorphization Thickness and Carbon Implantation on NiPt/Si Silicidation Process
2018 22nd International Conference on Ion Implantation Technology (IIT)
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10.1109/iit.2018.8807963
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2018
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Author(s):
Laurent Lachal
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Fabrice Nemouchi
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Frederic Mazen
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Philippe Rodriguez
◽
Magali Gregoire
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...
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