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Design-Process-Technology Co-optimization for Manufacturability XII
Latest Publications
TOTAL DOCUMENTS
34
(FIVE YEARS 0)
H-INDEX
1
(FIVE YEARS 0)
Published By SPIE
9781510616684, 9781510616691
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Latest Documents
Most Cited Documents
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Related Sources
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Front Matter: Volume 10588
Design-Process-Technology Co-optimization for Manufacturability XII
◽
10.1117/12.2324886
◽
2018
◽
Keyword(s):
Matter Volume
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Applying machine learning to pattern analysis for automated in-design layout optimization
Design-Process-Technology Co-optimization for Manufacturability XII
◽
10.1117/12.2299492
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2018
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Cited By ~ 1
Author(s):
Jason P. Cain
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Moutaz Fakhry
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Piyush Pathak
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Jason Sweis
◽
Frank Gennari
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...
Keyword(s):
Machine Learning
◽
Pattern Analysis
◽
Layout Optimization
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Litho friendly via insertion with in-design auto-fix flow using machine learning
Design-Process-Technology Co-optimization for Manufacturability XII
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10.1117/12.2297499
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2018
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Cited By ~ 1
Author(s):
Ahmed Elsemary
◽
Uwe Paul Schroeder
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Ahmed Mohyeldin
◽
Janam Bakshi
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Mohamed Ismail
◽
...
Keyword(s):
Machine Learning
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Combinational optical rule check on hotspot detection
Design-Process-Technology Co-optimization for Manufacturability XII
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10.1117/12.2297425
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2018
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Author(s):
Shumay Shang
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Hongxin Zhang
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Rui Wu
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Lianghong Yin
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Alex Wei
◽
...
Keyword(s):
Hotspot Detection
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Pattern analysis and classification accelerates OPC tuning, monitoring, and optimization and mask inspection
Design-Process-Technology Co-optimization for Manufacturability XII
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10.1117/12.2297097
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2018
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Author(s):
Ruoping Wang
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Paul Lupa
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Jason Sweis
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Ya-Chieh Lai
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Philippe Hurat
Keyword(s):
Pattern Analysis
◽
Mask Inspection
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A portable pattern-based design technology co-optimization flow to reduce optical proximity correction run-time
Design-Process-Technology Co-optimization for Manufacturability XII
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10.1117/12.2297077
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2018
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Author(s):
Yi Chieh Chen
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Ya-Chieh Lai
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Philippe Hurat
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Hung-Yu Lin
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Tsung-Han Li
◽
...
Keyword(s):
Design Technology
◽
Optical Proximity Correction
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Run Time
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An efficient way of layout processing based on calibre DRC and pattern matching for defects inspection application
Design-Process-Technology Co-optimization for Manufacturability XII
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10.1117/12.2297349
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2018
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Author(s):
Qijian Wan
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Helen Li
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Robben Li
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Tyzy Lee
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Teddy Xue
◽
...
Keyword(s):
Pattern Matching
◽
Defects Inspection
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Using pattern based layout comparison for a quick analysis of design changes
Design-Process-Technology Co-optimization for Manufacturability XII
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10.1117/12.2297346
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2018
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Author(s):
Lucas Huang
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Huan Kan
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Legender Yang
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Chunshan Du
◽
Xinyi Hu
◽
...
Keyword(s):
Design Changes
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Hybrid hotspot library building based on optical and geometry analysis at early stage for new node development
Design-Process-Technology Co-optimization for Manufacturability XII
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10.1117/12.2296834
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2018
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Author(s):
Yayi Wei
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Ying Chen
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Yajuan Su
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Tianyang Gai
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Xiaojing Su
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...
Keyword(s):
Early Stage
◽
Geometry Analysis
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Node Development
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Comparison between multi-colored LEn SADP/SAQP and selective-etching SADP/SAQP
Design-Process-Technology Co-optimization for Manufacturability XII
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10.1117/12.2297417
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2018
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Author(s):
Ahmed Hamed
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Rehab Kotb Ali
◽
James Word
Keyword(s):
Selective Etching
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