2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)
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Novel aspects of the atomic transport of B implanted in silicon at energies below 1 keV

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924115 ◽

2003 ◽

Author(s):

V. Privitera ◽

E. Napolitani ◽

F. Priolo ◽

S. Moffatt ◽

E. Rimini

Keyword(s):

Atomic Transport

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Role of buried oxide microstructure in dosimetry of implanted oxygen in SIMOX technology

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924140 ◽

2003 ◽

Author(s):

M.J. Anc ◽

B. Matthews ◽

R.P. Dolan

Keyword(s):

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Transformation of implantation induced interstitial point defects in dislocation loops

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924106 ◽

2003 ◽

Author(s):

M. Starostenkov ◽

G.M. Poletayev ◽

D.M. Starostenkov

Keyword(s):

Point Defects ◽

Dislocation Loops

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Energy enhancement on NV-GSD-HE

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924174 ◽

2003 ◽

Author(s):

H. Kariya ◽

K. Inada ◽

M. Tsukihara ◽

M. Sugitani ◽

Y. Murakami

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Influence of scribe lanes on wafer potentials and charging damage

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924216 ◽

2003 ◽

Author(s):

W. Lukaszek

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Junction profiles of sub keV ion implantation for deep sub-quarter micron devices

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924097 ◽

2003 ◽

Author(s):

A. Al-Bayati ◽

S. Tandon ◽

R. Doherty ◽

A. Murrell ◽

D. Wagner ◽

...

Keyword(s):

Ion Implantation

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Energy contamination control system in deceleration beam line

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924249 ◽

2003 ◽

Author(s):

H. Muroaka ◽

M. Tsukihara ◽

M. Kabasawa ◽

M. Sugitani ◽

Y. Hidaka

Keyword(s):

Control System ◽

Beam Line ◽

Contamination Control

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Process performance for Axcelis MC3 300 mm implanter

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924163 ◽

2003 ◽

Author(s):

R.D. Rathmell ◽

A.M. Ray ◽

F. Sato ◽

C.J. Godfrey

Keyword(s):

Process Performance

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Characterization of a Xenon plasma electron flood gun on a GSD-200E/sup 2/ high current implanter using Q/sub BD/, FLASH, SPIDER, and CHARM/sup TM/-2 wafers

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924212 ◽

2003 ◽

Author(s):

P. Kopalidis ◽

Y. Erokhin ◽

R. Santiesteban ◽

V. Soncini

Keyword(s):

Plasma Electron ◽

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Defects and gallium-contamination during focused ion beam micro machining

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924248 ◽

2003 ◽

Author(s):

C. Lehrer ◽

L. Frey ◽

S. Petersen ◽

M. Mizutani ◽

M. Takai ◽

...

Keyword(s):

Focused Ion Beam ◽

Ion Beam ◽

Micro Machining

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