2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)

Decaborane ion implantation

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924149 ◽

2003 ◽

Cited By ~ 5

Author(s):

A.S. Perel ◽

W. Krull ◽

D. Hoglund ◽

K. Jackson ◽

T. Horsky

Keyword(s):

Ion Implantation

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Application of indium ion implantation for halo doping: experimental and simulation results for advanced CMOS devices

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924085 ◽

2003 ◽

Cited By ~ 5

Author(s):

N. Variam ◽

S. Mehta ◽

T. Feudel ◽

M. Horstmann ◽

C. Krueger ◽

...

Keyword(s):

Ion Implantation ◽

Simulation Results ◽

Indium Ion

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Effect of implanted-helium depth profile on damage structures in electron-irradiated stainless steel

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924274 ◽

2003 ◽

Author(s):

T. Aruga ◽

Y. Katano

Keyword(s):

Stainless Steel ◽

Depth Profile

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Advantages of the varian VIISta single wafer high current ion implanter for advanced device fabrication

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924180 ◽

2003 ◽

Author(s):

G. Mezack ◽

T. Callahan ◽

S. Mehta ◽

U. Jeong

Keyword(s):

Device Fabrication ◽

High Current

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Plasma doping system for 200 and 300 mm wafers

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924190 ◽

2003 ◽

Cited By ~ 10

Author(s):

R.B. Liebert ◽

S.R. Walther ◽

S.B. Felch ◽

Ziwei Fang ◽

B.O. Pedersen ◽

...

Keyword(s):

Plasma Doping

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Energy contamination control system in deceleration beam line

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924249 ◽

2003 ◽

Cited By ~ 1

Author(s):

H. Muroaka ◽

M. Tsukihara ◽

M. Kabasawa ◽

M. Sugitani ◽

Y. Hidaka

Keyword(s):

Control System ◽

Beam Line ◽

Contamination Control

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Process performance for Axcelis MC3 300 mm implanter

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924163 ◽

2003 ◽

Author(s):

R.D. Rathmell ◽

A.M. Ray ◽

F. Sato ◽

C.J. Godfrey

Keyword(s):

Process Performance

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Characterization of a Xenon plasma electron flood gun on a GSD-200E/sup 2/ high current implanter using Q/sub BD/, FLASH, SPIDER, and CHARM/sup TM/-2 wafers

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924212 ◽

2003 ◽

Cited By ~ 1

Author(s):

P. Kopalidis ◽

Y. Erokhin ◽

R. Santiesteban ◽

V. Soncini

Keyword(s):

Plasma Electron ◽

High Current

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Defects and gallium-contamination during focused ion beam micro machining

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924248 ◽

2003 ◽

Cited By ~ 7

Author(s):

C. Lehrer ◽

L. Frey ◽

S. Petersen ◽

M. Mizutani ◽

M. Takai ◽

...

Keyword(s):

Focused Ion Beam ◽

Ion Beam ◽

Micro Machining

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Novel aspects of the atomic transport of B implanted in silicon at energies below 1 keV

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) ◽

10.1109/iit.2000.924115 ◽

2003 ◽

Cited By ~ 1

Author(s):

V. Privitera ◽

E. Napolitani ◽

F. Priolo ◽

S. Moffatt ◽

E. Rimini

Keyword(s):

Atomic Transport

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2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)
Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Decaborane ion implantation

Application of indium ion implantation for halo doping: experimental and simulation results for advanced CMOS devices

Effect of implanted-helium depth profile on damage structures in electron-irradiated stainless steel

Advantages of the varian VIISta single wafer high current ion implanter for advanced device fabrication

Plasma doping system for 200 and 300 mm wafers

Energy contamination control system in deceleration beam line

Process performance for Axcelis MC3 300 mm implanter

Characterization of a Xenon plasma electron flood gun on a GSD-200E/sup 2/ high current implanter using Q/sub BD/, FLASH, SPIDER, and CHARM/sup TM/-2 wafers

Defects and gallium-contamination during focused ion beam micro machining

Novel aspects of the atomic transport of B implanted in silicon at energies below 1 keV

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2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Decaborane ion implantation

Application of indium ion implantation for halo doping: experimental and simulation results for advanced CMOS devices

Effect of implanted-helium depth profile on damage structures in electron-irradiated stainless steel

Advantages of the varian VIISta single wafer high current ion implanter for advanced device fabrication

Plasma doping system for 200 and 300 mm wafers

Energy contamination control system in deceleration beam line

Process performance for Axcelis MC3 300 mm implanter

Characterization of a Xenon plasma electron flood gun on a GSD-200E/sup 2/ high current implanter using Q/sub BD/, FLASH, SPIDER, and CHARM/sup TM/-2 wafers

Defects and gallium-contamination during focused ion beam micro machining

Novel aspects of the atomic transport of B implanted in silicon at energies below 1 keV

2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)
Latest Publications