Process and Device Simulation for MOS-VLSI Circuits
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Published By Springer Netherlands

9789400968448, 9789400968424

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Ion Implantation

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_4 ◽

1983 ◽

pp. 125-179 ◽

Author(s):

Heiner Ryssel ◽

Klaus Hoffmann

Keyword(s):

Ion Implantation

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The Use of Chlorinated Oxides and Intrinsic Gettering Techniques for VLSI Processing

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_3 ◽

1983 ◽

pp. 88-124

Author(s):

C. L. Claeys

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Optical and Deep UV Lithography

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_10 ◽

1983 ◽

pp. 397-410

Author(s):

W. G. Oldham

Keyword(s):

Uv Lithography ◽

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Two Dimensional MOS-Transistor Modeling

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_13 ◽

1983 ◽

pp. 490-581 ◽

Author(s):

S. Selberherr ◽

A. Schütz ◽

H. Pötzl

Keyword(s):

Two Dimensional ◽

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Materials Characterization

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_6 ◽

1983 ◽

pp. 210-263

Author(s):

C. R. Helms

Keyword(s):

Materials Characterization

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Beam Annealing of Ion Implanted Silicon

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_5 ◽

1983 ◽

pp. 180-209

Author(s):

James F. Gibbons

Keyword(s):

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Analysis of Nonplanar Devices

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_12 ◽

1983 ◽

pp. 432-489 ◽

Author(s):

James A. Greenfield ◽

Craig H. Price ◽

Robert W. Dutton

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Wafer Topography Simulation

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_11 ◽

1983 ◽

pp. 411-431 ◽

Author(s):

A. R. Neureuther

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Diffusion in Silicon

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_1 ◽

1983 ◽

pp. 1-47 ◽

Author(s):

Dimitri A. Antoniadis

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Numerical Simulation of Impurity Redistribution Near Mask Edges

Process and Device Simulation for MOS-VLSI Circuits ◽

10.1007/978-94-009-6842-4_9 ◽

1983 ◽

pp. 343-396 ◽

Author(s):

R. Tielert

Keyword(s):

Numerical Simulation ◽

Impurity Redistribution

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