Chemical Vapor Deposition
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Published By Wiley (John Wiley & Sons)

1521-3862, 0948-1907
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Farewell and Welcome

2015 ◽  
Vol 21 (10-11-12) ◽  
pp. 213-215
Author(s):  
Michael L. Hitchman

From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition

2015 ◽  
Vol 21 (10-11-12) ◽  
pp. 216-240 ◽  
Author(s):  
Anatolii A. Malygin ◽  
Victor E. Drozd ◽  
Anatolii A. Malkov ◽  
Vladimir M. Smirnov
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Molecular Layering ◽  
Layer Deposition

Uniform Coating of Microparticles using CVD Polymerization

2015 ◽  
Vol 21 (10-11-12) ◽  
pp. 288-293 ◽  
Author(s):  
Yu Liang ◽  
Jacob H. Jordahl ◽  
Hao Ding ◽  
Xiaopei Deng ◽  
Joerg Lahann
Keyword(s):  
Uniform Coating

CVD Deposited Titania Thin Films for Gas Sensors with Improved Operating Characteristics

2015 ◽  
Vol 21 (10-11-12) ◽  
pp. 327-333 ◽  
Author(s):  
Marina V. Baryshnikova ◽  
Leonid A. Filatov ◽  
Andrey S. Petrov ◽  
Sergey E. Alexandrov
Keyword(s):  
Thin Films ◽  
Gas Sensors ◽  
Operating Characteristics

Phase-selective Route to V-O Film Formation: A Systematic MOCVD Study Into the Effects of Deposition Temperature on Structure and Morphology

2015 ◽  
Vol 21 (10-11-12) ◽  
pp. 319-326 ◽  
Author(s):  
Simon F. Spanò ◽  
Roberta G. Toro ◽  
Guglielmo G. Condorelli ◽  
Grazia M. L. Messina ◽  
Giovanni Marletta ◽  
...  
Keyword(s):  
Deposition Temperature ◽  
Film Formation ◽  
Structure And Morphology
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