IEEE International Integrated Reliability Workshop Final Report, 2004
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TOTAL DOCUMENTS

72

(FIVE YEARS 0)

H-INDEX

6

(FIVE YEARS 0)

Published By IEEE

0780385179

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Atomic scale defects involved in NBTI

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422752 ◽

2005 ◽

Author(s):

J.P. Campbell ◽

P.M. Lenahan ◽

A.T. Krishnan ◽

S. Krishnan

Keyword(s):

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Hydrogen release and defect generation rate in ultra-thin oxides

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422726 ◽

2005 ◽

Author(s):

V. Huard ◽

M. Denais ◽

F. Monsieur

Keyword(s):

Hydrogen Release ◽

Generation Rate ◽

Defect Generation

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Mechanism of dynamic NBTI of pMOSFETs

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422751 ◽

2005 ◽

Author(s):

B. Zhu ◽

J.S. Suehle ◽

J.B. Bernstein ◽

Y. Chen

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A comprehensive analysis of NFET degradation due to off-state stress

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422747 ◽

2005 ◽

Author(s):

K. Hofmann ◽

S. Holzbauser ◽

C.Y. Kuo

Keyword(s):

Comprehensive Analysis ◽

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An innovative multi-via test structure for wafer-level isothermal electromigration

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422762 ◽

2005 ◽

Author(s):

S.F.C. Tseng ◽

Wei-Ting Kary Chien ◽

Willings Wang

Keyword(s):

Test Structure ◽

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Circuit and silicide impact on the correlation between TLP and ESD (HBM and MM)

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422766 ◽

2005 ◽

Author(s):

S.C. Huang ◽

J.H. Lee ◽

S.C. Lee ◽

K.M. Chen ◽

M.H. Song ◽

...

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Electromigration in narrow and large damascene copper lines

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422742 ◽

2005 ◽

Author(s):

V. Girault ◽

F. Terrier ◽

M. Gregoire

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Characterization of alternative gate dielectrics using electrical I-V and C-V measurements

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422777 ◽

2005 ◽

Author(s):

K.Z. Ahmed

Keyword(s):

Gate Dielectrics

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Bayesian approach to reliability projection for high k dielectric thin films

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422771 ◽

2005 ◽

Author(s):

Wen Luo ◽

Way Kuo ◽

Yue Kuo

Keyword(s):

Bayesian Approach ◽

Dielectric Thin Films ◽

High K ◽

High K Dielectric

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The study of sputtered RF Ta on the PID in Cu dual damascene technology

IEEE International Integrated Reliability Workshop Final Report, 2004 ◽

10.1109/irws.2004.1422763 ◽

2005 ◽

Author(s):

Wen Hui Lu ◽

Kim Keng Teo ◽

Chaw Sing Ho ◽

Kin Leong Yap ◽

Keng Foo Lo

Keyword(s):

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