The study of sputtered RF Ta on the PID in Cu dual damascene technology
Keyword(s):
Keyword(s):
2003 ◽
Vol 150
(1)
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pp. G58
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2006 ◽
Vol 46
(9-11)
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pp. 1581-1586
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2005 ◽
Vol 26
(11)
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pp. 802-804
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2010 ◽
Vol 5
(3)
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pp. 545-549
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