1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium
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Published By IEEE

0780300270

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Gaining competitive advantage through continuous improvement programs

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146268 ◽

2002 ◽

Author(s):

R. Herrera ◽

A. Miller

Keyword(s):

Competitive Advantage ◽

Continuous Improvement ◽

Improvement Programs

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The focus of computer integrated manufacturing in the Japanese semiconductor industry

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146270 ◽

2002 ◽

Cited By ~ 1

Author(s):

B.P.F. Wu

Keyword(s):

Semiconductor Industry ◽

Computer Integrated Manufacturing ◽

Integrated Manufacturing

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Moving in-situ particle monitoring into manufacturing: a status report

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146269 ◽

2002 ◽

Cited By ~ 2

Author(s):

P. Borden ◽

J. Mason ◽

M. Klein

Keyword(s):

Status Report ◽

Particle Monitoring

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The intelligent microelectronics factory of the future

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146262 ◽

2002 ◽

Cited By ~ 6

Author(s):

G.B. Larrabee

Keyword(s):

The Future ◽

Factory Of The Future

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Automated malfunction diagnosis of a plasma etcher

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146267 ◽

2002 ◽

Cited By ~ 3

Author(s):

G.S. May ◽

C.J. Spanos

Keyword(s):

Malfunction Diagnosis

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A new knowledge-based expert system for inspection of ULSI process flow

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146271 ◽

2002 ◽

Cited By ~ 1

Author(s):

E. Fukuda ◽

M. Kimura ◽

K. Miura ◽

H. Fuji ◽

M. Tazawa

Keyword(s):

Expert System ◽

Process Flow ◽

Knowledge Based ◽

New Knowledge

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Performance evaluation of lot dispatching and scheduling algorithms through discrete event simulation

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146260 ◽

2002 ◽

Cited By ~ 3

Author(s):

P. O'Neil

Keyword(s):

Performance Evaluation ◽

Discrete Event Simulation ◽

Discrete Event ◽

Scheduling Algorithms ◽

Event Simulation

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Real time statistical process control for plasma etching

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146278 ◽

2002 ◽

Cited By ~ 18

Author(s):

H.-F. Guo ◽

C.J. Spanos ◽

A.J. Miller

Keyword(s):

Process Control ◽

Real Time ◽

Statistical Process Control ◽

Plasma Etching ◽

Statistical Process

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Long term cost of ownership: beyond purchase price (chip manufacture)

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146264 ◽

2002 ◽

Cited By ~ 16

Author(s):

R. Carnes ◽

M. Su

Keyword(s):

Purchase Price ◽

Cost Of Ownership

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The UL ISO 9000 registration process

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1991.146276 ◽

2002 ◽

Cited By ~ 1

Author(s):

H. Berman

Keyword(s):

Iso 9000 ◽

Registration Process

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1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science SymposiumLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Gaining competitive advantage through continuous improvement programs

The focus of computer integrated manufacturing in the Japanese semiconductor industry

Moving in-situ particle monitoring into manufacturing: a status report

The intelligent microelectronics factory of the future

Automated malfunction diagnosis of a plasma etcher

A new knowledge-based expert system for inspection of ULSI process flow

Performance evaluation of lot dispatching and scheduling algorithms through discrete event simulation

Real time statistical process control for plasma etching

Long term cost of ownership: beyond purchase price (chip manufacture)

The UL ISO 9000 registration process

1991 Proceedings IEEE/SEMI International Semiconductor Manufacturing Science Symposium
Latest Publications