2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
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9781509054480
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Process window discovery, expansion and control of design hotspots susceptible to overlay failures

2017 ◽  
Author(s):  
Kaushik Sah ◽  
Andrew Cross ◽  
Antonio Mani ◽  
Dieter Van Den Heuvel ◽  
Philippe Foubert
Keyword(s):  
Process Window ◽  
And Control

Reduction of wafer arcing during high aspect ratio etching

2017 ◽  
Author(s):  
Zusing Yang ◽  
Min-Feng Hung ◽  
Kuo-Pin Chang ◽  
Chih-Yao Lin ◽  
Sheng-Yuan Chang ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio

Amorphous silicon coatings for control of corrosion and metal ion contamination

2017 ◽  
Author(s):  
David A. Smith ◽  
Min Yuan ◽  
Jesse Bischof ◽  
Luke Patterson ◽  
James B. Mattzela
Keyword(s):  
Amorphous Silicon ◽  
Metal Ion
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