2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP)
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31

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9781424484003

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Model-based temperature control of heated plates

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623706 ◽

2010 ◽

Author(s):

J. L. Ebert ◽

G. W. van der Linden ◽

D. de Roover ◽

L. L. Porter ◽

R. L. Kosut ◽

...

Keyword(s):

Temperature Control ◽

Model Based ◽

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Activation of silicon wafer by excimer laser

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623789 ◽

2010 ◽

Author(s):

Rainer Paetzel ◽

Jan Brune ◽

Frank Simon ◽

Ludolf Herbst ◽

Masashi Machida ◽

...

Keyword(s):

Silicon Wafer ◽

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Effects of cluster carbon implantation at low temperature on damage recovery after rapid thermal annealing

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623605 ◽

2010 ◽

Author(s):

Hiroshi Onoda ◽

Nariaki Hamamoto ◽

Tsutomu Nagayama ◽

Shigeki Sakai ◽

Masayasu Tanjyo ◽

...

Keyword(s):

Low Temperature ◽

Thermal Annealing ◽

Rapid Thermal Annealing

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Characterization of dopant activation, mobility and diffusion in advanced millisecond laser spike annealing

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623601 ◽

2010 ◽

Author(s):

Shaoyin Chen ◽

Xiaoru Wang ◽

Michael Thompson ◽

Yun Wang ◽

Cam Lu ◽

...

Keyword(s):

Dopant Activation ◽

Spike Annealing ◽

And Diffusion ◽

Millisecond Laser

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Impact of laser anneal thermal budget on the quality of thin SiGe channels with a high Ge content

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623604 ◽

2010 ◽

Author(s):

Erik Rosseel ◽

Andriy Hikavyy ◽

Jean-Luc Everaert ◽

Liesbeth Witters ◽

Jerome Mitard ◽

...

Keyword(s):

Thermal Budget ◽

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Furnace annealing effects in the formation of titanium silicide Schottky barriers

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623793 ◽

2010 ◽

Author(s):

Elena Barbarini ◽

Salvatore Guastella ◽

Candido F. Pirri

Keyword(s):

Schottky Barriers ◽

Titanium Silicide ◽

Furnace Annealing ◽

Annealing Effects

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A novel hydrogen rich interfacial layer to downscale high-K dielectrics

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623796 ◽

2010 ◽

Author(s):

Shao Wei Wang ◽

Y.R. Wang ◽

Charles CL Lin ◽

Frank CC Huang ◽

Michael Chan ◽

...

Keyword(s):

Interfacial Layer ◽

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Full Device Exposure Laser Thermal Annealing: High performance and high yield junction formation process

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623599 ◽

2010 ◽

Author(s):

K. Huet ◽

C. Boniface ◽

R. Negru ◽

P. Aing ◽

J. Venturini

Keyword(s):

Thermal Annealing ◽

Formation Process ◽

High Performance ◽

Junction Formation

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Copyright page

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623608 ◽

2010 ◽

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Optimization of implant and anneal processes

2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ◽

10.1109/rtp.2010.5623787 ◽

2010 ◽

Author(s):

S. Prussin ◽

J. Reyes ◽

H. Onoda ◽

N. Hamamoto ◽

T. Nagayama ◽

...

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