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Metrology, Inspection, and Process Control for Microlithography XXXIII
Latest Publications
TOTAL DOCUMENTS
100
(FIVE YEARS 100)
H-INDEX
1
(FIVE YEARS 1)
Published By SPIE
9781510625655, 9781510625662
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Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Super-resolution fluorescence nanoscopy opportunities for EUV resist inspection and metrology (Conference Presentation)
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2515260
◽
2019
◽
Author(s):
John S. Petersen
Keyword(s):
Super Resolution
◽
Fluorescence Nanoscopy
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Machine learning and hybrid metrology using scatterometry and LE-XRF to detect voids in copper lines
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2515257
◽
2019
◽
Cited By ~ 1
Author(s):
Dexin Kong
◽
Koichi Motoyama
◽
Abraham Arceo de la peña
◽
Huai Huang
◽
Brock Mendoza
◽
...
Keyword(s):
Machine Learning
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Improved sub-surface AFM using photothermal actuation
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2515441
◽
2019
◽
Cited By ~ 1
Author(s):
Maarten E. van Reijzen
◽
Mehmet S. Tamer
◽
Maarten H. van Es
◽
Martijn M. C. J. M. van Riel
◽
Sasan Keyvani
◽
...
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Machine learning for predictive electrical performance using OCD (Erratum)
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2541616
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2019
◽
Author(s):
Sayantan Das
◽
Joey Hung
◽
Sandip Halder
◽
Guillaume Schelcher
◽
Roy Koret
◽
...
Keyword(s):
Machine Learning
◽
Electrical Performance
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Full structure transistor process monitoring of boron and germanium in PFET EPI using in-line XPS
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2515266
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2019
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Author(s):
Jusang Lee
◽
Ganesh Subramanian
◽
Manasa Medikonda
◽
Hossam Lazkani
◽
Judson Holt
◽
...
Keyword(s):
Process Monitoring
◽
Full Structure
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Front Matter: Volume 10959
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2532423
◽
2019
◽
Keyword(s):
Matter Volume
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SEM inspection and review method for addressing EUV stochastic defects
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2514877
◽
2019
◽
Author(s):
Tal Itzkovich
◽
Aner Avakrat
◽
Shimon Levi
◽
Omri Baum
◽
Noam Amit
◽
...
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3D optical proximity model optimization using inline 3DSEM metrology
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2514666
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2019
◽
Author(s):
Shimon Levi
◽
Ishai Schwarzban
◽
Angela Karvtsov
◽
Matan Tobayas
◽
Hans-Jurgen Stock
◽
...
Keyword(s):
Model Optimization
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Edge placement error measurement in lithography process with die to database algorithm
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2515143
◽
2019
◽
Author(s):
Yoshishige Sato
◽
Shang-Chieh Huang
◽
Kotaro Maruyama
◽
Yuichiro Yamazaki
Keyword(s):
Error Measurement
◽
Lithography Process
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Application of aberration corrected low voltage SEM for metrology
Metrology, Inspection, and Process Control for Microlithography XXXIII
◽
10.1117/12.2516017
◽
2019
◽
Cited By ~ 1
Author(s):
Zhaohui Cheng
◽
Hideto Dohi
◽
Shingo Hayashi
◽
Kotoko Hirose
◽
Hideyuki Kazumi
Keyword(s):
Low Voltage
◽
Aberration Corrected
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